Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6525696 | 0.94 | — | — | |
| SCHEMBL17456440 | 0.94 | RECQL (0.60) | — | |
| SCHEMBL2634707 | 0.94 | — | — | |
| Lithium Ion SCHEMBL17456536 | 0.94 | — | — | |
| SCHEMBL6862979 | 0.94 | RECQL (0.60) | — | |
| Water SCHEMBL1134659 | 0.92 | RECQL (0.64) | — | |
| Methyl Alcohol SCHEMBL27946779 | 0.90 | RECQL (0.56) | — | |
| Tetramethylammonium Ion SCHEMBL4623396 | 0.90 | RECQL (0.56) | — | |
| Lithium Ion SCHEMBL28616477 | 0.85 | RECQL (0.52) | — | |
| Potassium Ion SCHEMBL6534824 | 0.84 | TSHR (0.75) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107998980-B | One kind is containing two selenium anionic surfactants and its preparation method and application | 江南大学 | 2019-08-02 | — | — | CN | disclosed |
| US-9403960-B2 | Irradiated fluoropolymer articles having low leachable fluoride ions | ARKEMA INC. (US) | 2016-08-02 | — | — | US | disclosed |
| EP-2714789-B1 | IRRADIATED FLUOROPOLYMER ARTICLES HAVING LOW LEACHABLE FLUORIDE IONS | ARKEMA INC (US) | 2016-02-03 | — | — | EP | disclosed |
| US-20150329697-A1 | IRRADIATED FLUOROPOLYMER ARTICLES HAVING LOW LEACHABLE FLUORIDE IONS | ARKEMA INC. (US) | 2015-11-19 | — | — | US | disclosed |
| US-9120912-B2 | Irradiated fluoropolymer articles having low leachable fluoride ions | ARKEMA INC. (US) | 2015-09-01 | — | — | US | disclosed |
| US-20140148528-A1 | IRRADIATED FLUOROPOLYMER ARTICLES HAVING LOW LEACHABLE FLUORIDE IONS | ARKEMA INC. | 2014-05-29 | — | — | US | disclosed |
| WO-2012162341-A1 | IRRADIATED FLUOROPOLYMER ARTICLES HAVING LOW LEACHABLE FLUORIDE IONS | ARKEMA INC. (US) | 2012-11-29 | — | — | WO | disclosed |
| US-4857402-A | Magnetic recording medium | FUJI PHOTO FILM CO., LTD. (JP) | 1989-08-15 | — | — | US | disclosed |
| US-4214183-A | DIELECTRIC CHARGE STORAGE LAYER CONTAINING RUBIDIUM OXIDE OR FRANCIUM OXIDE | OWENS-ILLINOIS, INC. (US) | 1980-07-22 | — | — | US | disclosed |
| US-4121133-A | Dielectric for multiple gaseous discharge display/memory panel having improved voltage characteristics | OWENS-ILLINOIS, INC. (US) | 1978-10-17 | — | — | US | disclosed |
| US-4114064-A | MULTIPLE GASEOUS DISCHARGE DISPLAY/MEMORY PANEL HAVING IMPROVED VOLTAGE CHARACTERISTICS | OWENS-ILLINOIS, INC. (US) | 1978-09-12 | — | — | US | disclosed |
| US-3932920-A | MEMORY PANEL HAVING IMPROVED VOLTAGE CHARACTERISTICS | OWENS-ILLINOIS, INC. (US) | 1976-01-20 | — | — | US | disclosed |