SCHEMBL2637892

SCHEMBL2637892

CC(C)(Nc1ccccc1)c1cccc(C(C)(C)Nc2ccccc2)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.39
MAPT P10636 2/20 0.39
KMT2A Q03164 2/20 0.39
ALDH1A1 P00352 1/20 0.39
AR P10275 1/20 0.39
MAPKAPK2 P49137 1/20 0.39
KCNK9 Q9NPC2 1/20 0.39
GAA P10253 1/20 0.39
KCNN4 O15554 1/20 0.38
MAPK1 P28482 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
TSHR P16473 1/20 0.37
P2RX7 Q99572 1/20 0.37
HTT P42858 1/20 0.37
RAB9A P51151 1/20 0.37
IDH2 P48735 1/20 0.37
VNN1 O95497 3/20 0.37
ESR1 P03372 1/20 0.36
ESR2 Q92731 1/20 0.36
KDM4C Q9H3R0 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL450601 0.89 MAPKAPK2 (0.46) ALDH1A1MAPKAPK2KCNN4MAPK1TSHR
Hydrochloric Acid SCHEMBL8507149 0.86 MAPKAPK2 (0.45) ALDH1A1MAPKAPK2KCNN4MAPK1TSHR
SCHEMBL2034204 0.84 MAPKAPK2 (0.42) MAPTALDH1A1MAPKAPK2KCNK9KCNN4
SCHEMBL5311107 0.84 KIF11 (0.46) MEN1MAPTKMT2AALDH1A1KCNK9
SCHEMBL22432318 0.82 ABCG2 (0.44) MEN1MAPTKMT2AMAPKAPK2KCNK9
SCHEMBL28897187 0.81 ALDH1A1 (0.54) MEN1MAPTKMT2AALDH1A1AR
SCHEMBL5298722 0.80 PTPRC (0.51) MEN1MAPTKMT2AALDH1A1GAA
SCHEMBL9222314 0.79 HDAC3 (0.46) MEN1MAPTKMT2AALDH1A1NPSR1
SCHEMBL5303678 0.79 KMT2A (0.46) MEN1KMT2AALDH1A1MAPKAPK2GAA
SCHEMBL10583323 0.79 MEN1 (0.53) MEN1MAPTKMT2AALDH1A1MAPKAPK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112368330-B Thermoplastic resin composition and method for producing same 大金工业株式会社 2023-03-21 CN disclosed
WO-2015031927-A1 PHOTOINITIATOR DURST PHOTOTECHNIK DIGITAL TECHNOLOGY GMBH (AT) 2015-03-12 WO disclosed
EP-2569380-A1 INK-JET PRINTER INK Durst Phototechnik Digital Technology GmbH (AT) 2013-03-20 EP disclosed
WO-2011140577-A1 INK-JET PRINTER INK DURST PHOTOTECHNIK DIGITAL TECHNOLOGY GMBH (AT) 2011-11-17 WO disclosed
EP-1051440-A1 LOW-TOXICITY, HIGH-TEMPERATURE POLYIMIDES Maverick Corporation (US) 2000-11-15 EP disclosed
WO-1999036462-A1 LOW-TOXICITY, HIGH-TEMPERATURE POLYIMIDES MAVERICK CORPORATION (US) 1999-07-22 WO disclosed
US-5478682-A Patterned exposure and alkaline development of a photosensitive resin covering a film aligned in one direction prior to aligning uncovered film portion in another direction JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-12-26 US disclosed