Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.55 |
| ▸ | TSHR | P16473 | 2/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.55 |
| ▸ | MEN1 | O00255 | 1/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | CA2 | P00918 | 3/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.38 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.38 |
| ▸ | GMNN | O75496 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | THPO | P40225 | 1/20 | 0.38 |
| ▸ | MTOR | P42345 | 1/20 | 0.38 |
| ▸ | BLM | P54132 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6881426 | 1.00 | LMNA (0.56) | LMNAALDH1A1TSHRHSD17B10MEN1 | |
| SCHEMBL11074411 | 0.95 | LMNA (0.61) | LMNAALDH1A1TSHRHSD17B10MEN1 | |
| SCHEMBL27801117 | 0.95 | LMNA (0.61) | LMNAALDH1A1TSHRHSD17B10MEN1 | |
| SCHEMBL8959863 | 0.95 | LMNA (0.61) | LMNAALDH1A1TSHRHSD17B10MEN1 | |
| SCHEMBL31528891 | 0.95 | LMNA (0.61) | LMNAALDH1A1TSHRHSD17B10MEN1 | |
| SCHEMBL18723162 | 0.93 | LMNA (0.65) | LMNAALDH1A1TSHRHSD17B10MEN1 | |
| SCHEMBL6420270 | 0.93 | LMNA (0.65) | LMNAALDH1A1TSHRHSD17B10MEN1 | |
| SCHEMBL21118320 | 0.93 | LMNA (0.65) | LMNAALDH1A1TSHRHSD17B10MEN1 | |
| SCHEMBL20774392 | 0.93 | LMNA (0.65) | LMNAALDH1A1TSHRHSD17B10MEN1 | |
| SCHEMBL18723113 | 0.93 | LMNA (0.65) | LMNAALDH1A1TSHRHSD17B10MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2012067755-A2 | PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-24 | — | — | WO | claimed |
| JP-4831777-B2 | — | — | 2011-12-07 | — | — | JP | claimed |
| JP-2008519297-A | — | — | 2008-06-05 | — | — | JP | claimed |
| US-20080032228-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-07 | — | — | US | claimed |
| EP-1820061-A1 | SILICON CONTAINING TARC/BARRIER LAYER | International Business Machines Corporation (US) | 2007-08-22 | — | — | EP | claimed |
| WO-2006057782-A1 | SILICON CONTAINING TARC/BARRIER LAYER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-06-01 | — | — | WO | claimed |
| US-20130288178-A1 | PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-31 | — | — | US | disclosed |
| EP-1820061-B1 | METHOD OF FORMING A PATTERNED MATERIAL USING A SILICON CONTAINING TARC/BARRIER LAYER | IBM (US) | 2013-01-02 | — | — | EP | disclosed |
| WO-2012067755-A2 | PHOTORESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-24 | — | — | WO | disclosed |
| WO-2010086288-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS AND METHOD OF FORMING A PATTERN USING IT | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-08-05 | — | — | WO | disclosed |
| US-20100178619-A1 | METHOD FOR ENHANCING LITHOGRAPHIC IMAGING OF ISOLATED AND SEMI-ISOLATED FEATURES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-07-15 | — | — | US | disclosed |
| EP-1934654-B1 | METHOD OF FORMING A PATTERNED MATERIAL FEATURE ON A SUBSTRATE UTILISING A TOP ANTIREFLECTIVE COATING COMPOSITION WITH LOW REFRACTIVE INDEX AT 193NM RADIATION WAVELENGTH | IBM (US) | 2010-01-20 | — | — | EP | disclosed |
| US-20080032228-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-02-07 | — | — | US | disclosed |
| EP-1820061-A1 | SILICON CONTAINING TARC/BARRIER LAYER | International Business Machines Corporation (US) | 2007-08-22 | — | — | EP | disclosed |
| WO-2006057782-A1 | SILICON CONTAINING TARC/BARRIER LAYER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-06-01 | — | — | WO | disclosed |