⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26412145 | 0.85 | — | — | |
| SCHEMBL26412143 | 0.83 | GNAI3 (0.30) | — | |
| SCHEMBL24943972 | 0.82 | — | — | |
| SCHEMBL26412142 | 0.82 | ARG1 (0.31) | — | |
| SCHEMBL22372748 | 0.82 | ARG1 (0.31) | — | |
| SCHEMBL26477352 | 0.79 | — | — | |
| SCHEMBL22372725 | 0.78 | ARG1 (0.32) | — | |
| SCHEMBL22372986 | 0.78 | ARG1 (0.32) | — | |
| SCHEMBL26480273 | 0.78 | — | — | |
| SCHEMBL22372944 | 0.78 | EPHX2 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |