SCHEMBL26412465

SCHEMBL26412465

CC(C)(OC(=O)Cc1ccccc1)C1CCNCC1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HRH1 P35367 2/20 0.42
KMT2A Q03164 2/20 0.42
TSHR P16473 1/20 0.42
MEN1 O00255 1/20 0.42
LMNA P02545 1/20 0.42
CYP2D6 P10635 1/20 0.42
SCN1A P35498 1/20 0.42
SCN2A Q99250 1/20 0.42
SCN3A Q9NY46 1/20 0.42
ALDH1A1 P00352 2/20 0.41
MAPK1 P28482 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
GBA1 P04062 1/20 0.41
GLA P06280 1/20 0.40
HPGD P15428 1/20 0.40
PAM P19021 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.39
CYP19A1 P11511 1/20 0.39
ADRB2 P07550 1/20 0.39
ADRB1 P08588 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22373255 0.90 SLC7A5 (0.39) HRH1KMT2AMEN1LMNACYP2D6
SCHEMBL22373210 0.89 CACNA1B (0.50) L3MBTL1
SCHEMBL22373196 0.88 CYP19A1 (0.38) HRH1KMT2AMEN1LMNACYP2D6
SCHEMBL22372985 0.88 CYP19A1 (0.38) ALDH1A1SMN1; SMN2CYP19A1
SCHEMBL22372859 0.88 KMT2A (0.41) KMT2AMEN1CYP2D6ALDH1A1HPGD
SCHEMBL22372900 0.87 HRH1 (0.40) HRH1KMT2AMEN1LMNACYP2D6
SCHEMBL22372780 0.86 MAPT (0.44) HRH1KMT2ATSHRLMNAALDH1A1
SCHEMBL22373046 0.86 CES2 (0.41) HRH1KMT2AMEN1LMNACYP2D6
SCHEMBL22372872 0.86 LMNA (0.43) LMNAHPGDSMN1; SMN2CYP19A1
SCHEMBL26477748 0.86 MEN1 (0.43) KMT2AMEN1LMNAALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR HRH1 2246/4885KMT2A 1033/4885TSHR 3385/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.