Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRM1 | P35372 | 4/20 | 0.62 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.45 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.42 |
| ▸ | TACR1 | P25103 | 1/20 | 0.41 |
| ▸ | OPRD1 | P41143 | 2/20 | 0.40 |
| ▸ | OPRK1 | P41145 | 2/20 | 0.40 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.40 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.40 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.40 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24944914 | 0.97 | OPRM1 (0.58) | OPRM1HDAC1AKR1C1OPRD1OPRK1 | |
| SCHEMBL24943761 | 0.94 | OPRM1 (0.56) | OPRM1AKR1C1 | |
| SCHEMBL24944070 | 0.93 | OPRM1 (0.55) | OPRM1AKR1C1 | |
| SCHEMBL26413737 | 0.89 | OPRM1 (0.51) | OPRM1 | |
| SCHEMBL24943748 | 0.87 | OPRM1 (0.49) | OPRM1AKR1C1 | |
| SCHEMBL26413856 | 0.86 | OPRM1 (0.54) | OPRM1AKR1C1 | |
| SCHEMBL26413345 | 0.84 | OPRM1 (0.51) | OPRM1HDAC1TACR1OPRD1OPRK1 | |
| SCHEMBL24944640 | 0.84 | OPRM1 (0.48) | OPRM1HDAC1AKR1C1TACR1OPRD1 | |
| SCHEMBL373568 | 0.83 | OPRM1 (0.50) | OPRM1HDAC1AKR1C1TACR1OPRD1 | |
| SCHEMBL378799 | 0.81 | OPRM1 (0.70) | OPRM1HDAC1TACR1OPRD1OPRK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |