SCHEMBL26413709

SCHEMBL26413709

COc1cccc(CC(=O)OC2(c3ccccc3)CCNCC2)c1

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TACR1 P25103 1/20 0.46
CTBP2 P56545 1/20 0.45
SIGMAR1 Q99720 3/20 0.44
CYP1A2 P05177 1/20 0.43
SLC6A2 P23975 2/20 0.42
SLC6A4 P31645 2/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
CCR8 P51685 2/20 0.42
POLB P06746 1/20 0.42
KCNH2 Q12809 1/20 0.42
USP2 O75604 1/20 0.42
CYP2D6 P10635 1/20 0.41
SLC6A3 Q01959 1/20 0.41
PDGFRB P09619 1/20 0.41
PDGFRA P16234 1/20 0.41
ALDH1A1 P00352 1/20 0.41
CASP3 P42574 1/20 0.41
CASP7 P55210 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944477 0.91 TACR1 (0.53) TACR1SIGMAR1L3MBTL1CCR8KCNH2
SCHEMBL24944474 0.89 OPRM1 (0.44) TACR1L3MBTL1ALDH1A1
SCHEMBL24943734 0.87 ALDH1A1 (0.46) TACR1L3MBTL1USP2ALDH1A1
SCHEMBL26413730 0.86 OPRM1 (0.44) TACR1CTBP2L3MBTL1POLB
SCHEMBL24944885 0.85 OPRM1 (0.46) TACR1L3MBTL1ALDH1A1
SCHEMBL24944886 0.85 TACR1 (0.41) TACR1CTBP2SIGMAR1SLC6A2SLC6A4
SCHEMBL26478733 0.84 TACR1 (0.40) TACR1SIGMAR1SLC6A4KCNH2ALDH1A1
SCHEMBL24944618 0.84 TACR1 (0.44) TACR1CTBP2SIGMAR1SLC6A2SLC6A4
SCHEMBL24944711 0.82 SLC6A4 (0.41) TACR1CYP1A2SLC6A2SLC6A4KCNH2
SCHEMBL24943732 0.82 GAA (0.51) CYP1A2CCR8KCNH2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR TACR1 2183/4885CTBP2 133/4885SIGMAR1 327/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.