SCHEMBL26423787

SCHEMBL26423787

CCN(C)c1ccccc1C(=O)O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.48
ALOX15 P16050 1/20 0.48
SMN1; SMN2 Q16637 3/20 0.47
TSHR P16473 3/20 0.47
GAA P10253 2/20 0.47
MAPT P10636 2/20 0.47
TP53 P04637 1/20 0.47
ABCC1 P33527 1/20 0.45
TDP1 Q9NUW8 2/20 0.44
PTPN1 P18031 5/20 0.44
KMT2A Q03164 3/20 0.43
KDM4E B2RXH2 3/20 0.42
HPGD P15428 2/20 0.42
GLA P06280 2/20 0.42
POLB P06746 2/20 0.42
LMNA P02545 1/20 0.42
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
HMGB1 P09429 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31084573 0.86 ALDH1A1 (0.50) ALDH1A1ALOX15SMN1; SMN2TSHRGAA
SCHEMBL1009390 0.86 TSHR (0.64) ALDH1A1SMN1; SMN2TSHRGAAMAPT
SCHEMBL26423790 0.85 TSHR (0.47) ALDH1A1SMN1; SMN2TSHRGAAMAPT
SCHEMBL1574195 0.84 TSHR (0.44) ALDH1A1ALOX15SMN1; SMN2TSHRGAA
SCHEMBL8585148 0.84 ALDH1A1 (0.52) ALDH1A1SMN1; SMN2TSHRGAAMAPT
SCHEMBL4607462 0.83 ALDH1A1 (0.46) ALDH1A1ALOX15SMN1; SMN2TSHRGAA
SCHEMBL21042294 0.83 KMT2A (0.49) ALDH1A1SMN1; SMN2TSHRGAAMAPT
SCHEMBL29129841 0.83 MAPT (0.46) ALDH1A1SMN1; SMN2TSHRGAAMAPT
SCHEMBL1668024 0.82 TP53 (0.53) ALDH1A1ALOX15SMN1; SMN2TSHRGAA
SCHEMBL10708630 0.82 KDM4E (0.49) ALDH1A1ALOX15SMN1; SMN2TSHRGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023189803-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION 日産化学株式会社 2023-10-05 WO disclosed
WO-2023189799-A1 SELF CROSS-LINKABLE POLYMER AND RESIST UNDERLAYER FILM-FORMING COMPOSITION 日産化学株式会社 2023-10-05 WO disclosed