SCHEMBL26423792

SCHEMBL26423792

CCN(C)c1ccccc1C(=O)NC

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.49
PLK1 P53350 2/20 0.46
BRD4 O60885 2/20 0.43
BRD2 P25440 1/20 0.43
BRD3 Q15059 1/20 0.43
BRDT Q58F21 1/20 0.43
ALDH1A1 P00352 3/20 0.43
TSHR P16473 3/20 0.43
TP53 P04637 1/20 0.43
MAPT P10636 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
KMT2A Q03164 4/20 0.40
MEN1 O00255 2/20 0.40
KAT2B Q92831 1/20 0.40
BAZ2B Q9UIF8 1/20 0.40
HSD17B10 Q99714 1/20 0.40
ADRA1D P25100 1/20 0.40
ADRA1A P35348 1/20 0.40
ADRA1B P35368 1/20 0.40
HTT P42858 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26444538 0.84 GAA (0.50) GAAPLK1BRD4BRD2BRD3
Alcohol SCHEMBL6836573 0.83 GAA (0.56) GAAPLK1BRD4BRD2BRD3
SCHEMBL7446834 0.82 GAA (0.64) GAAPLK1BRD4BRD2BRD3
SCHEMBL1009390 0.82 TSHR (0.64) GAAALDH1A1TSHRTP53MAPT
SCHEMBL26423787 0.80 ALDH1A1 (0.48) GAAALDH1A1TSHRTP53MAPT
SCHEMBL26423790 0.80 TSHR (0.47) GAAALDH1A1TSHRTP53MAPT
SCHEMBL8585148 0.79 ALDH1A1 (0.52) GAAALDH1A1TSHRTP53MAPT
SCHEMBL26423789 0.79 KMT2A (0.59) GAAALDH1A1TSHRTP53MAPT
SCHEMBL29129841 0.79 MAPT (0.46) GAAALDH1A1TSHRTP53MAPT
SCHEMBL21042294 0.79 KMT2A (0.49) GAAALDH1A1TSHRTP53MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023189803-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION 日産化学株式会社 2023-10-05 WO disclosed
WO-2023189799-A1 SELF CROSS-LINKABLE POLYMER AND RESIST UNDERLAYER FILM-FORMING COMPOSITION 日産化学株式会社 2023-10-05 WO disclosed