SCHEMBL26426596

SCHEMBL26426596

CCCCCCCCCCCCN(CCOC(=O)c1cc(I)cc(I)c1I)CCOC(=O)c1cc(I)cc(I)c1I

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.45
TSHR P16473 3/20 0.43
LMNA P02545 2/20 0.43
ALDH1A1 P00352 2/20 0.43
KMT2A Q03164 1/20 0.41
CYP3A4 P08684 2/20 0.40
TP53 P04637 1/20 0.40
MAPK1 P28482 1/20 0.40
CYP1A2 P05177 2/20 0.40
CYP2D6 P10635 2/20 0.40
SCN1A P35498 2/20 0.40
SCN2A Q99250 2/20 0.40
SCN3A Q9NY46 2/20 0.40
CHRM2 P08172 1/20 0.40
HTR1A P08908 1/20 0.40
GAA P10253 1/20 0.40
DRD3 P35462 1/20 0.40
SLC6A3 Q01959 1/20 0.40
KCNH2 Q12809 1/20 0.40
KDM4E B2RXH2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426606 1.00 ESR1 (0.45) ESR1TSHRLMNAALDH1A1KMT2A
SCHEMBL26426590 0.95 SCN1A (0.44) ESR1TSHRLMNAALDH1A1KMT2A
SCHEMBL21705752 0.95 SCN1A (0.44) ESR1TSHRLMNAALDH1A1KMT2A
SCHEMBL21705730 0.91 TSHR (0.39) ESR1TSHRLMNAALDH1A1KMT2A
SCHEMBL21705273 0.91 TSHR (0.39) ESR1TSHRLMNAALDH1A1KMT2A
SCHEMBL26426577 0.88 HDAC3 (0.39) ESR1TSHRLMNAKMT2ACYP3A4
SCHEMBL21705750 0.86 SCN1A (0.40) ESR1TSHRLMNAALDH1A1KMT2A
SCHEMBL21783823 0.85 HTR3A (0.50) TSHRLMNAKMT2ACYP3A4CYP1A2
SCHEMBL26426576 0.85 HTR3A (0.47) TSHRLMNAKMT2ACYP3A4CYP1A2
SCHEMBL26426605 0.85 HDAC3 (0.39) ESR1TSHRLMNAKMT2ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed