SCHEMBL26457350

SCHEMBL26457350

COC(=O)C1C2CC3C(NS(=O)(=O)C31)C2OC(=O)CN1CCCCC1

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 5/20 0.37
▸ MEN1 O00255 2/20 0.37
▸ KMT2A Q03164 2/20 0.37
▸ TDP1 Q9NUW8 1/20 0.33
▸ MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26475571 0.85 MEN1 (0.35) ALDH1A1MEN1KMT2A
SCHEMBL26457359 0.85 MEN1 (0.32) ALDH1A1MEN1KMT2A
SCHEMBL26475554 0.84 MEN1 (0.32) ALDH1A1MEN1KMT2A
SCHEMBL26457360 0.80 — —
SCHEMBL26457301 0.78 ALDH1A1 (0.37) ALDH1A1MEN1KMT2ATDP1
SCHEMBL26475555 0.77 — —
SCHEMBL26475557 0.77 — —
SCHEMBL26475574 0.77 MEN1 (0.31) ALDH1A1MEN1KMT2A
SCHEMBL26457338 0.74 ALDH1A1 (0.38) ALDH1A1MEN1KMT2A
SCHEMBL26457358 0.72 MEN1 (0.36) ALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230137472-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 — — US disclosed
US-20230137472-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 — — US disclosed
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