⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26457309 | 0.83 | — | — | |
| SCHEMBL26475509 | 0.80 | — | — | |
| SCHEMBL26457301 | 0.76 | ALDH1A1 (0.37) | — | |
| SCHEMBL26457307 | 0.75 | MEN1 (0.32) | — | |
| SCHEMBL26475523 | 0.74 | MEN1 (0.36) | — | |
| SCHEMBL26475632 | 0.73 | MEN1 (0.37) | — | |
| SCHEMBL26147249 | 0.72 | KMT2A (0.34) | — | |
| SCHEMBL26475506 | 0.72 | MEN1 (0.32) | — | |
| SCHEMBL26475522 | 0.71 | MEN1 (0.35) | — | |
| SCHEMBL26457295 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230134822-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230134822-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |