Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAB9A | P51151 | 3/20 | 0.47 |
| ▸ | NPC1 | O15118 | 2/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.47 |
| ▸ | MEN1 | O00255 | 3/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.42 |
| ▸ | PDGFRA | P16234 | 1/20 | 0.42 |
| ▸ | CASP3 | P42574 | 7/20 | 0.39 |
| ▸ | SENP8 | Q96LD8 | 7/20 | 0.39 |
| ▸ | SENP7 | Q9BQF6 | 7/20 | 0.39 |
| ▸ | SENP6 | Q9GZR1 | 6/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | GRM4 | Q14833 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29472962 | 0.85 | KDM4E (0.57) | RAB9ANPC1SMN1; SMN2KMT2AMEN1 | |
| SCHEMBL24443170 | 0.82 | L3MBTL1 (0.38) | RAB9ANPC1SMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL28091115 | 0.78 | NPC1 (0.38) | RAB9ANPC1SMN1; SMN2L3MBTL1KMT2A | |
| Benzene SCHEMBL28280515 | 0.78 | NPC1 (0.38) | RAB9ANPC1SMN1; SMN2L3MBTL1KMT2A | |
| SCHEMBL18119627 | 0.77 | IDH1 (0.32) | RAB9ANPC1SMN1; SMN2TDP1L3MBTL1 | |
| SCHEMBL28742482 | 0.76 | KDM4E (0.48) | RAB9ANPC1SMN1; SMN2KMT2AMEN1 | |
| SCHEMBL28869271 | 0.76 | KDM4E (0.48) | RAB9ANPC1SMN1; SMN2KMT2AMEN1 | |
| SCHEMBL56387 | 0.76 | L3MBTL1 (0.54) | RAB9ANPC1SMN1; SMN2L3MBTL1KMT2A | |
| Ammonia Solution, Strong SCHEMBL28360184 | 0.74 | L3MBTL1 (0.52) | RAB9ANPC1SMN1; SMN2L3MBTL1KMT2A | |
| SCHEMBL17972535 | 0.73 | NPC1 (0.58) | RAB9ANPC1SMN1; SMN2TDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023203845-A1 | COMPOSITION AND PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2023-10-26 | — | — | WO | disclosed |
| WO-2023203837-A1 | COMPOSITION AND PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2023-10-26 | — | — | WO | disclosed |
| CN-110471257-A | The manufacturing method of photosensitive polymer combination, photosensitive dry film and its manufacturing method, resist film, substrate and plating forming object | TOKYO OHKA KOGYO COMPANY | 2019-11-19 | — | — | CN | disclosed |
| CN-106483760-B | Photosensitive composite, its manufacturing method, the forming method of film, viscosity increase suppressing method, Photoepolymerizationinitiater initiater and its manufacturing method | 东京应化工业株式会社 | 2019-11-12 | — | — | CN | disclosed |
| CN-110389498-A | Light curing resin composition, optical filter and photoresist | 常州强力先端电子材料有限公司 | 2019-10-29 | — | — | CN | disclosed |
| CN-104749884-B | Photosensitive polymer combination | 东京应化工业株式会社 | 2019-10-18 | — | — | CN | disclosed |
| CN-110317174-A | Hydrogen barrier, hydrogen barrier film, which are formed, uses composition, hydrogen barrier film, the manufacturing method of hydrogen barrier film and electronic component | 东京应化工业株式会社 | 2019-10-11 | — | — | CN | disclosed |
| CN-110034009-A | Reworking method and acidic cleaning solution | 东京应化工业株式会社 | 2019-07-19 | — | — | CN | disclosed |
| CN-109962089-A | The manufacturing method of wavelength convert substrate | 东京应化工业株式会社 | 2019-07-02 | — | — | CN | disclosed |
| CN-109765754-A | Solidification compound, cured film forming method, solidfied material, the cured film and transparent optical component being patterned | 东京应化工业株式会社 | 2019-05-17 | — | — | CN | disclosed |
| CN-101006561-A | Solvent for cleaning | TOKYO OHKA KOGYO CO LTD (JP) | 2007-07-25 | — | — | CN | disclosed |
| CN-1982425-A | Detergent | TOKYO OHKA KOGYO CO LTD (JP) | 2007-06-20 | — | — | CN | disclosed |
| CN-1912742-A | Colorant dispersion liquid and photosensitive composition using the same | TOKYO OKE CHEMICAL CO LTD (JP) | 2007-02-14 | — | — | CN | disclosed |
| CN-1900248-A | Cleaning agent for resin composition | TOKYO OHKA KOGYO CO LTD (JP) | 2007-01-24 | — | — | CN | disclosed |
| CN-1884464-A | Detergent | TOKYO OHKA KOGYO CO LTD (JP) | 2006-12-27 | — | — | CN | disclosed |
| CN-1717763-A | Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device | TOKYO OHKA KOGYO CO LTD (JP) | 2006-01-04 | — | — | CN | disclosed |
| CN-1212545-C | Photosensitive insulated glue composition and photosensitive film of the glue | TOKYO APPLIED CHEMICAL CO LTD (JP) | 2005-07-27 | — | — | CN | disclosed |
| CN-1204586-C | Manufacture of plasma display plate | TOKYO APPLIED CHEMICAL CO LTD (JP) | 2005-06-01 | — | — | CN | disclosed |
| CN-1384138-A | Photosensitive insulated glue composition and photosensitive film of the glue | TOKYO APPLIED CHEMICAL CO LTD (JP) | 2002-12-11 | — | — | CN | disclosed |
| CN-1384521-A | Manufacture of plasma display plate | TOKYO APPLIED CHEMICAL CO LTD (JP) | 2002-12-11 | — | — | CN | disclosed |