SCHEMBL26667

SCHEMBL26667

NCCNCCCCNCCN

nearest known ligand 0.85

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 5/20 0.85
CA6 P23280 5/20 0.85
CA7 P43166 5/20 0.85
CA9 Q16790 5/20 0.85
CA14 Q9ULX7 5/20 0.85
CA5B Q9Y2D0 5/20 0.85
CA2 P00918 4/20 0.85
CA4 P22748 4/20 0.85
CA5A P35218 4/20 0.85
CA3 P07451 3/20 0.85
MEN1 O00255 2/20 0.83
RECQL P46063 2/20 0.83
KMT2A Q03164 2/20 0.83
ALOX15 P16050 3/20 0.79
F13A1 P00488 2/20 0.79
CYP1A2 P05177 2/20 0.79
THPO P40225 2/20 0.79
CASP2 P42575 2/20 0.79
CYP2C19 P33261 2/20 0.79
HSD17B10 Q99714 1/20 0.79

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6251707 0.96 CA12 (0.79) CA12CA6CA7CA9CA14
SCHEMBL7712115 0.96 CA12 (0.79) CA12CA6CA7CA9CA14
SCHEMBL6658738 0.96 CA12 (0.79) CA12CA6CA7CA9CA14
Hydrochloric Acid SCHEMBL3673346 0.96 UBE2N (0.80) CA12CA6CA7CA9CA14
SCHEMBL11808474 0.93 CA12 (0.79) CA12CA6CA7CA9CA14
Hydrochloric Acid SCHEMBL6250226 0.93 UBE2N (0.75) CA12CA6CA7CA9CA14
SCHEMBL9720429 0.93 CA12 (0.79) CA12CA6CA7CA9CA14
SCHEMBL17071917 0.93 CA12 (0.93) CA12CA6CA7CA9CA14
SCHEMBL817632 0.93
SCHEMBL345134 0.92 CA12 (1.00) CA12CA6CA7CA9CA14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200071566-A1 SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING KCTECH CO., LTD. (KR) 2020-03-05 US claimed
US-7695345-B2 Polishing compound for semiconductor integrated circuit device, polishing method and method for producing semiconductor integrated circuit device ASAHI GLASS COMPANY, LIMITED (JP) 2010-04-13 US claimed
US-20250215264-A1 SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, METHOD OF PREPARING SAME, AND CHEMICAL MECHANICAL POLISHING METHOD OF WAFER SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-07-03 US disclosed
US-20250043149-A1 SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING APPARATUS SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-02-06 US disclosed
US-11826485-B2 Crosslinked gels comprising polyalkyleneimines, and their uses as medical devices HYPERBRANCH MEDICAL TECHNOLOGY, INC. (US) 2023-11-28 US disclosed
US-10829690-B2 Slurry composition for chemical mechanical polishing, method of preparing the same, and method of fabricating semiconductor device by using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2020-11-10 US disclosed
US-20200071566-A1 SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING KCTECH CO., LTD. (KR) 2020-03-05 US disclosed
US-20200071613-A1 SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, METHOD OF PREPARING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE BY USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2020-03-05 US disclosed
US-9803107-B2 Polishing agent, polishing method and method for manufacturing semiconductor integrated circuit device ASAHI GLASS COMPANY, LIMITED (JP) 2017-10-31 US disclosed
EP-2734507-B1 PROCESS FOR THE SYNTHESIS OF N-SUBSTITUTED CYCLIC ALKYLENE UREAS ALLNEX IP S À R L (LU) 2017-05-31 EP disclosed
US-9440928-B2 Process for the synthesis of N-substituted cyclic alkylene ureas Allnex IP S.ar.L. (LU) 2016-09-13 US disclosed
EP-1160267-B1 CATALYST FOR OXIDATIVE POLYMERIZATION OF FLUOROPHENOL, METHOD OF OXIDATIVE POLYMERIZATION OF FLUOROPHENOL, AND POLY(OXYFLUOROPHENYLENE) DERIVATIVE JAPAN SCIENCE & TECH CORP (JP) 2004-08-04 EP disclosed
US-6689919-B1 SOLUBLE POLY(OXYFLUOROPHENYLENE) COMPOUNDS WITH EXCELLENT HEAT RESISTANCE, MEMBRANE-FORMABILITY AND CHEMICAL STABILITY JAPAN SCIENCE AND TECHNOLOGY CORPORATION (JP) 2004-02-10 US disclosed
US-6673890-B1 DETERGENTS, DISPERSANTS BASF AKTIENGESELLSCHAFT (DE) 2004-01-06 US disclosed
EP-1198492-B1 ZWITTERIONIC POLYAMINES AND A PROCESS FOR THEIR PRODUCTION BASF AG (DE) 2003-10-08 EP disclosed
US-5789418-A Bis-naphthalimides for the treatment of cancer BASF AKTIENGESELLSCHAFT (DE) 1998-08-04 US disclosed
EP-0714387-B1 NEW BIS-NAPHTHALIMIDES FOR THE TREATMENT OF CANCER BASF AG (DE) 1998-05-27 EP disclosed
EP-0042940-B1 HETEROALKYLENE-BIS-ANTHRAQUINONES AMERICAN CYANAMID COMPANY (US) 1984-06-06 EP disclosed
EP-0042940-A1 Heteroalkylene-bis-anthraquinones AMERICAN CYANAMID COMPANY (US) 1982-01-06 EP disclosed
US-4278605-A ANTITUMOR AGENTS AMERICAN CYANAMID COMPANY (US) 1981-07-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11826485-B2 Crosslinked gels comprising polyalkyleneimines, and their uses as medical devices PLOD3, LIG3, PLOD2 CA12 2264/4885CA6 2865/4885CA7 2878/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.