SCHEMBL266776

SCHEMBL266776

POc1ccccn1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL7926690 0.79 KDM4E (0.50)
SCHEMBL409030 0.78 KDM4E (0.55)
SCHEMBL4728794 0.76 KDM4E (0.52)
Hydrochloric Acid SCHEMBL28670387 0.76 KDM4E (0.53)
Phosphine SCHEMBL17979775 0.76 KDM4E (0.53)
SCHEMBL3878948 0.74
SCHEMBL8601029 0.74
Hydrochloric Acid SCHEMBL6749305 0.74 KDM4E (0.50)
SCHEMBL15561907 0.74 KDM4E (0.50)
SCHEMBL119581 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8133581-B2 Electroconductive polymer composition, electroconductive polymer material and method for producing electroconductive polymer material FUJIFILM CORPORATION (JP) 2012-03-13 US disclosed
US-20100136329-A1 ELECTROCONDUCTIVE POLYMER COMPOSITION, ELECTROCONDUCTIVE POLYMER MATERIAL AND METHOD FOR PRODUCING ELECTROCONDUCTIVE POLYMER MATERIAL FUJIFILM CORPORATION (JP) 2010-06-03 US disclosed