SCHEMBL266814

SCHEMBL266814

[C-]#[N+]/C(=C\c1cc(OC)c(C)cc1OCC(CC)CCCC)c1cc(OCC(C)CC)c(/C(C#N)=C/C)cc1OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10051596 0.95 — —
SCHEMBL13399532 0.93 — —
SCHEMBL10062490 0.87 — —
SCHEMBL17453318 0.84 TDP1 (0.36) —
SCHEMBL17678681 0.80 MAPT (0.31) —
SCHEMBL12317154 0.79 THRA (0.32) —
SCHEMBL12200903 0.76 ALDH1A1 (0.33) —
SCHEMBL10014874 0.73 — —
SCHEMBL15745446 0.73 ALDH1A1 (0.35) —
SCHEMBL10025405 0.72 ALDH1A1 (0.33) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8133581-B2 Electroconductive polymer composition, electroconductive polymer material and method for producing electroconductive polymer material FUJIFILM CORPORATION (JP) 2012-03-13 — — US disclosed
US-20100246014-A1 ANTIREFLECTIVE FILM, POLARIZING PLATE, IMAGE DISPLAY DEVICE AND COATING COMPOSITION FOR FORMING LOW REFRACTIVE INDEX LAYER FUJIFILM CORPORATION (JP) 2010-09-30 — — US disclosed
US-20100136329-A1 ELECTROCONDUCTIVE POLYMER COMPOSITION, ELECTROCONDUCTIVE POLYMER MATERIAL AND METHOD FOR PRODUCING ELECTROCONDUCTIVE POLYMER MATERIAL FUJIFILM CORPORATION (JP) 2010-06-03 — — US disclosed
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