SCHEMBL26784221

SCHEMBL26784221

C=C(I)C(=O)OCCN1CCCCC1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.46
MEN1 O00255 1/20 0.46
HPGD P15428 1/20 0.42
ALDH1A1 P00352 2/20 0.41
POLB P06746 1/20 0.41
MAPT P10636 1/20 0.41
PSMB1 P20618 2/20 0.41
PSMB5 P28074 2/20 0.41
PSMB2 P49721 2/20 0.41
MAPK1 P28482 2/20 0.40
BCHE P06276 2/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
CYP1A2 P05177 2/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
CYP2D6 P10635 1/20 0.39
CYP2C9 P11712 1/20 0.39
TSHR P16473 1/20 0.39
THPO P40225 1/20 0.39
CHRM2 P08172 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23870683 0.83 MEN1 (0.40) KMT2AMEN1ALDH1A1POLBMAPT
SCHEMBL25142030 0.83 ARG1 (0.32) KMT2AMEN1BCHECHRM2CHRM4
SCHEMBL26784250 0.83 ATM (0.49) KMT2AMEN1HPGDALDH1A1BCHE
SCHEMBL26784845 0.82 KMT2A (0.46) KMT2AMEN1HPGDALDH1A1POLB
SCHEMBL21274378 0.82 KMT2A (0.46) KMT2AMEN1HPGDALDH1A1POLB
SCHEMBL881770 0.82 KMT2A (0.46) KMT2AMEN1HPGDALDH1A1POLB
SCHEMBL68651 0.82 KMT2A (0.46) KMT2AMEN1HPGDALDH1A1POLB
SCHEMBL25142335 0.81 HRH3 (0.33) KMT2AMEN1HPGDALDH1A1MAPK1
SCHEMBL328570 0.81 KMT2A (0.51) KMT2AMEN1HPGDALDH1A1POLB
SCHEMBL14959640 0.81 KMT2A (0.51) KMT2AMEN1HPGDALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed