⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3907343 | 0.76 | — | — | |
| SCHEMBL1667000 | 0.73 | — | — | |
| SCHEMBL3845264 | 0.66 | — | — | |
| SCHEMBL1482962 | 0.66 | — | — | |
| SCHEMBL564582 | 0.66 | — | — | |
| SCHEMBL1991245 | 0.66 | ALDH1A1 (0.33) | — | |
| SCHEMBL15051868 | 0.66 | ALDH1A1 (0.39) | — | |
| SCHEMBL28059719 | 0.66 | CYP2C9 (0.32) | — | |
| SCHEMBL158980 | 0.65 | POLB (0.41) | — | |
| SCHEMBL27635344 | 0.64 | CYP2C9 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10336851-B2 | Copolymer for semiconductor lithography, resist composition, and method for manufacturing substrate | MITSUBISHI CHEMICAL CORPORATION | 2019-07-02 | — | — | US | disclosed |
| US-9850334-B2 | Manufacturing method of polymer | TOYO GOSEI CO., LTD. (JP) | 2017-12-26 | — | — | US | disclosed |
| US-9733564-B2 | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-20170037169-A1 | MANUFACTURING METHOD OF POLYMER | TOYO GOSEI CO., LTD. (JP) | 2017-02-09 | — | — | US | disclosed |
| US-9527938-B2 | Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate | MITSUBISHI RAYON CO., LTD. (JP) | 2016-12-27 | — | — | US | disclosed |
| US-20160200849-A1 | COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2016-07-14 | — | — | US | disclosed |
| US-9296842-B2 | Polymer for lithography | MITSUBISHI RAYON CO., LTD. (JP) | 2016-03-29 | — | — | US | disclosed |
| WO-2015159530-A1 | MANUFACTURING METHOD OF POLYMER | TOYO GOSEI CO., LTD. (JP) | 2015-10-22 | — | — | WO | disclosed |
| US-9109060-B2 | Method for producing polymer, polymer for lithography, resist composition, and method for producing substrate | MITSUBISHI RAYON, CO., LTD. (JP) | 2015-08-18 | — | — | US | disclosed |
| US-9023578-B2 | Copolymer for lithography and method for evaluating the same | MITSUBISHI RAYON CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20150099230-A1 | COPOLYMER FOR LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME, RESIST COMPOSITION, AND METHOD OF MANUFACTURING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2015-04-09 | — | — | US | disclosed |
| US-20130331533-A1 | POLYMER FOR LITHOGRAPHY | MITSUBISHI RAYON CO., LTD. (JP) | 2013-12-12 | — | — | US | disclosed |
| US-20130224654-A1 | COPOLYMERS FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, RESIST COMPOSITION, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN FORMED THEREUPON, METHOD FOR EVALUATING COPOLYMERS, AND METHOD FOR ANALYZING COPOLYMER COMPOSITIONS | MITSUBISHI RAYON CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20120111099-A1 | COPOLYMER FOR LITHOGRAPHY AND METHOD FOR EVALUATING THE SAME | MITSUBISHI RAYON CO., LTD. (JP) | 2012-05-10 | — | — | US | disclosed |
| US-20120115086-A1 | METHOD FOR PRODUCING POLYMER, POLYMER FOR LITHOGRAPHY, RESIST COMPOSITION, AND METHOD FOR PRODUCING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2012-05-10 | — | — | US | disclosed |