Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 3/20 | 0.34 |
| ▸ | CYP4A11 | Q02928 | 3/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | APP | P05067 | 1/20 | 0.32 |
| ▸ | NAAA | Q02083 | 1/20 | 0.32 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.30 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12026615 | 0.98 | CYP4F2 (0.37) | CYP4F2CYP4A11EPHX2APPNAAA | |
| SCHEMBL17409257 | 0.98 | CYP4F2 (0.37) | CYP4F2CYP4A11EPHX2APPNAAA | |
| SCHEMBL13402867 | 0.98 | CYP4F2 (0.37) | CYP4F2CYP4A11EPHX2APPNAAA | |
| SCHEMBL2680602 | 0.95 | CYP4F2 (0.35) | CYP4F2CYP4A11EPHX2APPALDH1A1 | |
| SCHEMBL753684 | 0.87 | CYP4F2 (0.33) | CYP4F2CYP4A11 | |
| SCHEMBL15198867 | 0.87 | MEN1 (0.31) | — | |
| SCHEMBL13667082 | 0.85 | CYP4F2 (0.42) | CYP4F2CYP4A11NAAAALDH1A1FKBP1A | |
| SCHEMBL16256497 | 0.85 | BBOX1 (0.33) | — | |
| SCHEMBL10093664 | 0.84 | ACHE (0.33) | — | |
| SCHEMBL13667073 | 0.83 | CYP4F2 (0.46) | CYP4F2CYP4A11NAAAALDH1A1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8900793-B2 | Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| US-20120308932-A1 | POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS USING SAID CHEMICALLY AMPLIFIED RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-06 | — | — | US | disclosed |
| US-8088537-B2 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20110305979-A1 | RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-12-15 | — | — | US | disclosed |
| US-7704671-B2 | comprising hydrophilic support, undercoat layer and laser-sensitive photopolymerizable layer, wherein undercoat layer contains copolymer containing a repeating unit having at least one ethylenically unsaturated bond and repeating unit having functional group capable of interacting with surface of support | FUJIFILM CORPORATION (JP) | 2010-04-27 | — | — | US | disclosed |
| US-20090197200-A1 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-7514204-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-07 | — | — | US | disclosed |
| US-7455952-B2 | Patterning process and resist overcoat material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-11-25 | — | — | US | disclosed |
| US-20080096131-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-24 | — | — | US | disclosed |
| US-20070072116-A1 | comprising hydrophilic support, undercoat layer and laser-sensitive photopolymerizable layer, wherein undercoat layer contains copolymer containing a repeating unit having at least one ethylenically unsaturated bond and repeating unit having functional group capable of interacting with surface of support | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |