Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 2/20 | 0.51 |
| ▸ | TSHR | P16473 | 1/20 | 0.51 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | PHLPP2 | Q6ZVD8 | 1/20 | 0.44 |
| ▸ | SCN1A | P35498 | 1/20 | 0.42 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.42 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26807519 | 0.94 | SMN1; SMN2 (0.49) | SMN1; SMN2LMNATSHRMEN1KMT2A | |
| SCHEMBL26807511 | 0.93 | LMNA (0.54) | SMN1; SMN2LMNATSHRMEN1KMT2A | |
| SCHEMBL19563523 | 0.91 | PHLPP2 (0.55) | SMN1; SMN2LMNATSHRMEN1KMT2A | |
| SCHEMBL26809610 | 0.86 | LMNA (0.49) | SMN1; SMN2LMNATSHRMEN1KMT2A | |
| SCHEMBL21783797 | 0.85 | TSHR (0.71) | SMN1; SMN2LMNATSHRMEN1KMT2A | |
| SCHEMBL26809394 | 0.84 | LMNA (0.54) | SMN1; SMN2LMNATSHRMEN1KMT2A | |
| SCHEMBL16349527 | 0.83 | LMNA (0.64) | LMNATSHRTDP1ALDH1A1KDM4E | |
| SCHEMBL21705611 | 0.82 | TSHR (0.52) | SMN1; SMN2LMNATSHRMEN1KMT2A | |
| SCHEMBL26809418 | 0.81 | LMNA (0.45) | SMN1; SMN2LMNATSHRMEN1KMT2A | |
| SCHEMBL21705607 | 0.81 | TSHR (0.61) | SMN1; SMN2LMNATSHRMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11829067-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |