SCHEMBL26809394

SCHEMBL26809394

CCN(O)CCOC(=O)c1cccc(I)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 3/20 0.54
▸ TSHR P16473 2/20 0.54
▸ SMN1; SMN2 Q16637 2/20 0.52
▸ MEN1 O00255 1/20 0.52
▸ KMT2A Q03164 1/20 0.52
▸ CYP2D6 P10635 2/20 0.43
▸ MAOA P21397 2/20 0.43
▸ HRH3 Q9Y5N1 2/20 0.43
▸ HTR3A P46098 1/20 0.43
▸ BLM P54132 1/20 0.42
▸ NPSR1 Q6W5P4 1/20 0.42
▸ SCN1A P35498 2/20 0.41
▸ SCN2A Q99250 2/20 0.41
▸ SCN3A Q9NY46 2/20 0.41
▸ ESR1 P03372 1/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ CYP2C19 P33261 1/20 0.41
▸ KCNH2 Q12809 1/20 0.41
▸ SIGMAR1 Q99720 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26809610 0.91 LMNA (0.49) LMNATSHRSMN1; SMN2MEN1KMT2A
SCHEMBL21783797 0.87 TSHR (0.71) LMNATSHRSMN1; SMN2MEN1KMT2A
SCHEMBL26809418 0.86 LMNA (0.45) LMNATSHRSMN1; SMN2MEN1KMT2A
SCHEMBL26807511 0.86 LMNA (0.54) LMNATSHRSMN1; SMN2MEN1KMT2A
SCHEMBL19563523 0.84 PHLPP2 (0.55) LMNATSHRSMN1; SMN2MEN1KMT2A
SCHEMBL26807546 0.84 SMN1; SMN2 (0.54) LMNATSHRSMN1; SMN2MEN1KMT2A
SCHEMBL21705607 0.83 TSHR (0.61) LMNATSHRSMN1; SMN2MEN1KMT2A
SCHEMBL26809402 0.82 TSHR (0.54) LMNATSHRSMN1; SMN2CYP2D6MAOA
SCHEMBL16349527 0.82 LMNA (0.64) LMNATSHRESR1ALDH1A1HDAC1
SCHEMBL46838 0.80 ESR1 (0.62) LMNATSHRSMN1; SMN2CYP2D6ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
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