SCHEMBL26807623

SCHEMBL26807623

CN1C(C)(C)CC(OC(=O)c2ccc3cc(OC(=O)c4cc(I)cc(I)c4I)ccc3c2)CC1(C)C

nearest known ligand 0.35

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 2/20 0.35
▸ PTPN2 P17706 1/20 0.33
▸ PTPN1 P18031 1/20 0.33
▸ CYP2D6 P10635 2/20 0.32
▸ HGFAC Q04756 1/20 0.32
▸ ALDH1A1 P00352 1/20 0.32
▸ ESR1 P03372 1/20 0.32
▸ HSD17B10 Q99714 1/20 0.32
▸ GAA P10253 2/20 0.32
▸ KMT2A Q03164 2/20 0.31
▸ POLB P06746 1/20 0.31
▸ HTT P42858 1/20 0.31
▸ GAPDH P04406 1/20 0.31
▸ HSPA1A P0DMV8 1/20 0.31
▸ HSPA8 P11142 1/20 0.31
▸ PTPN7 P35236 1/20 0.31
▸ F12 P00748 3/20 0.31
▸ HRH3 Q9Y5N1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26807617 0.92 TSHR (0.40) TSHRPTPN2PTPN1CYP2D6ALDH1A1
SCHEMBL26807897 0.91 TSHR (0.35) TSHRPTPN2PTPN1CYP2D6HGFAC
SCHEMBL26427858 0.83 TSHR (0.37) TSHRPTPN2PTPN1CYP2D6ALDH1A1
SCHEMBL26807892 0.83 TSHR (0.39) TSHRPTPN2PTPN1CYP2D6ALDH1A1
SCHEMBL26807860 0.81 TSHR (0.40) TSHRALDH1A1ESR1GAAKMT2A
SCHEMBL26812155 0.75 GAA (0.41) TSHRPTPN2PTPN1CYP2D6ALDH1A1
SCHEMBL26807630 0.75 TSHR (0.32) TSHRGAAHTT
SCHEMBL26807658 0.74 TSHR (0.33) TSHRGAAKMT2AHTT
SCHEMBL26810080 0.74 GAA (0.47) TSHRPTPN2PTPN1ALDH1A1ESR1
SCHEMBL26807591 0.74 PTPN2 (0.55) TSHRPTPN2PTPN1CYP2D6ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
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