SCHEMBL26807897

SCHEMBL26807897

CN1C(C)(C)CC(OC(=O)c2ccc3cc(OC(=O)c4cc(I)cc(I)c4O)ccc3c2)CC1(C)C

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 2/20 0.35
▸ HGFAC Q04756 2/20 0.34
▸ KMT2A Q03164 6/20 0.33
▸ CYP2D6 P10635 2/20 0.33
▸ PTPN2 P17706 1/20 0.33
▸ PTPN1 P18031 1/20 0.33
▸ ESR1 P03372 4/20 0.32
▸ ALDH1A1 P00352 2/20 0.32
▸ HSD17B10 Q99714 1/20 0.32
▸ MEN1 O00255 3/20 0.31
▸ CASP3 P42574 2/20 0.31
▸ SENP8 Q96LD8 2/20 0.31
▸ SENP7 Q9BQF6 2/20 0.31
▸ SENP6 Q9GZR1 2/20 0.31
▸ NPC1 O15118 1/20 0.31
▸ ESR2 Q92731 1/20 0.31
▸ GAA P10253 2/20 0.31
▸ POLB P06746 1/20 0.30
▸ TMPRSS2 O15393 1/20 0.30
▸ MLNR O43193 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26807892 0.92 TSHR (0.39) TSHRKMT2ACYP2D6PTPN2PTPN1
SCHEMBL26807623 0.91 TSHR (0.35) TSHRHGFACKMT2ACYP2D6PTPN2
SCHEMBL26807860 0.90 TSHR (0.40) TSHRKMT2AESR1ALDH1A1MEN1
SCHEMBL26812155 0.84 GAA (0.41) TSHRKMT2ACYP2D6PTPN2PTPN1
SCHEMBL26807585 0.84 TSHR (0.36) TSHRKMT2ACYP2D6PTPN2PTPN1
SCHEMBL26807617 0.83 TSHR (0.40) TSHRKMT2ACYP2D6PTPN2PTPN1
SCHEMBL26807896 0.79 TSHR (0.37) TSHRKMT2ACYP2D6PTPN2PTPN1
SCHEMBL26807893 0.77 TSHR (0.34) TSHRKMT2ACYP2D6PTPN2PTPN1
SCHEMBL26807887 0.75 SERPINE1 (0.33) TSHRGAAHTT
SCHEMBL26427858 0.73 TSHR (0.37) TSHRKMT2ACYP2D6PTPN2PTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
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