SCHEMBL26807860

SCHEMBL26807860

CN1C(C)(C)CC(OC(=O)c2cccc(OC(=O)c3cc(I)cc(I)c3O)c2)CC1(C)C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 2/20 0.40
▸ ALDH1A1 P00352 1/20 0.38
▸ GAA P10253 2/20 0.36
▸ ESR1 P03372 1/20 0.36
▸ ESR2 Q92731 1/20 0.36
▸ KMT2A Q03164 3/20 0.35
▸ SERPINE1 P05121 1/20 0.34
▸ HTR3E A5X5Y0 1/20 0.33
▸ HTR3B O95264 1/20 0.33
▸ CHRNA7 P36544 1/20 0.33
▸ HTR3A P46098 1/20 0.33
▸ HTR3D Q70Z44 1/20 0.33
▸ HTR3C Q8WXA8 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ CASP3 P42574 1/20 0.33
▸ SENP8 Q96LD8 1/20 0.33
▸ SENP7 Q9BQF6 1/20 0.33
▸ SENP6 Q9GZR1 1/20 0.33
▸ HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26807897 0.90 TSHR (0.35) TSHRALDH1A1GAAESR1ESR2
SCHEMBL26807892 0.89 TSHR (0.39) TSHRALDH1A1GAAESR1KMT2A
SCHEMBL26807585 0.84 TSHR (0.36) TSHRALDH1A1GAAESR1KMT2A
SCHEMBL26812155 0.81 GAA (0.41) TSHRALDH1A1GAAESR1KMT2A
SCHEMBL26807623 0.81 TSHR (0.35) TSHRALDH1A1GAAESR1KMT2A
SCHEMBL26807617 0.80 TSHR (0.40) TSHRALDH1A1GAAESR1KMT2A
SCHEMBL26807893 0.79 TSHR (0.34) TSHRALDH1A1GAAESR1ESR2
SCHEMBL26807589 0.79 TSHR (0.51) TSHRALDH1A1GAAESR1KMT2A
SCHEMBL26807896 0.78 TSHR (0.37) TSHRALDH1A1GAAESR1KMT2A
SCHEMBL11336780 0.77 TSHR (0.57) TSHRALDH1A1GAAESR1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
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