SCHEMBL26807865

SCHEMBL26807865

CN1C(C)(C)CC(OC(=O)C2CC3CC(OC(=O)c4cc(I)cc(I)c4O)C2C3)CC1(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26807889 0.85 — —
SCHEMBL26807585 0.83 TSHR (0.36) —
SCHEMBL26807887 0.79 SERPINE1 (0.33) —
SCHEMBL26807916 0.78 — —
SCHEMBL26807635 0.76 — —
SCHEMBL26807892 0.74 TSHR (0.39) —
SCHEMBL26807868 0.74 — —
SCHEMBL26807851 0.73 CYP2D6 (0.31) —
SCHEMBL26427858 0.73 TSHR (0.37) —
SCHEMBL26807771 0.72 TTR (0.34) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
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