SCHEMBL26807771

SCHEMBL26807771

CN1C(C)(C)CC(OC(=O)c2cc(I)cc(I)c2O)C1(C)C

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ TTR P02766 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26807774 0.89 — —
SCHEMBL26807585 0.85 TSHR (0.36) TTR
SCHEMBL26807777 0.85 TSHR (0.30) —
SCHEMBL26807782 0.80 PTPN2 (0.37) —
SCHEMBL26807779 0.80 MAP2K2 (0.35) —
SCHEMBL26807781 0.80 MEN1 (0.36) —
SCHEMBL26807766 0.79 PTPN2 (0.48) —
SCHEMBL26807785 0.78 KMT2A (0.34) —
SCHEMBL26807786 0.78 MGLL (0.34) —
SCHEMBL26807791 0.78 PTPN2 (0.38) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
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