Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.51 |
| ▸ | THRB | P10828 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | APEX1 | P27695 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8850908 | 0.93 | TSHR (0.55) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL9186435 | 0.93 | TSHR (0.55) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL153197 | 0.92 | TSHR (0.47) | TSHRTHRBALDH1A1 | |
| SCHEMBL28137662 | 0.92 | TSHR (0.54) | TSHRTHRBALDH1A1MEN1MAPT | |
| SCHEMBL27829221 | 0.90 | THRB (0.46) | TSHRTHRBALDH1A1ATMHPGD | |
| SCHEMBL8850591 | 0.90 | TSHR (0.51) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL8850423 | 0.89 | TSHR (0.46) | TSHRTHRBALDH1A1LMNAHSD17B10 | |
| SCHEMBL18812860 | 0.89 | TSHR (0.42) | TSHRTHRB | |
| Propanol SCHEMBL9227279 | 0.88 | TSHR (0.50) | TSHRTHRBALDH1A1POLBAPEX1 | |
| SCHEMBL11023010 | 0.88 | TSHR (0.58) | TSHRTHRBALDH1A1POLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 232 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108884384-B | Curable resin system containing quantum dots | 陶氏环球技术有限责任公司 | 2021-08-24 | — | — | CN | claimed |
| EP-3443047-B1 | CURABLE RESIN SYSTEM CONTAINING QUANTUM DOTS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2021-06-02 | — | — | EP | claimed |
| US-10982134-B2 | Polymer composite containing quantum dots | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2021-04-20 | — | — | US | claimed |
| US-10894916-B2 | Curable resin system containing quantum dots | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2021-01-19 | — | — | US | claimed |
| CN-108699196-B | Quantum dot-containing polymer composite material | 陶氏环球技术有限责任公司 | 2021-01-01 | — | — | CN | claimed |
| US-6627720-B2 | Monoethylenically unsaturated monomers are polymerized with at least one multiethylenically unsaturated monomer at high temperatures by free radical polymerization in a continuous reactor, without formation of highly crosslinked gels | JOHNSON POLYMER, LLC | 2003-09-30 | — | — | US | claimed |
| US-6265511-B1 | BLEND OF DIVINYL MONOMER AND MONOETHYLENICALLY UNSATURATED MONOMER | S. C. JOHNSON COMMERICAL MARKETS, INC. | 2001-07-24 | — | — | US | claimed |
| US-20250155808-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2025-05-15 | — | — | US | disclosed |
| WO-2024143072-A1 | COMPOSITION AND CURED PRODUCT | 株式会社ADEKA | 2024-07-04 | — | — | WO | disclosed |
| US-20240150549-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, TRANSPARENT ANTENNA AND MANUFACTURING METHOD THEREFOR, AND IMAGE DISPLAY DEVICE | RESONAC CORPORATION (JP) | 2024-05-09 | — | — | US | disclosed |
| WO-2024070672-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 日本ゼオン株式会社 | 2024-04-04 | — | — | WO | disclosed |
| CN-116940600-A | Resin composition, cured product, laminate, transparent antenna, method for producing transparent antenna, and image display device | 株式会社力森诺科 | 2023-10-24 | — | — | CN | disclosed |
| WO-2023189969-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 日本ゼオン株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-5986020-A | HEATING MONOMER MIXTURE AND FREE RADICAL CATALYST WITH MULTI UNSATURATED COMPOUNDS | BASF CORPORATION | 1999-11-16 | — | — | US | disclosed |
| EP-0909752-A1 | DI(METH)ACRYLATES | Kyowa Yuka Co., Ltd. (JP) | 1999-04-21 | — | — | EP | disclosed |
| WO-1999007754-A1 | PROCESS FOR PRODUCING HYPERBRANCHED POLYMERS | S.C. JOHNSON COMMERCIAL MARKETS, INC. (US) | 1999-02-18 | — | — | WO | disclosed |
| EP-0661307-B1 | Transparent resin and plastic lens | HITACHI CHEMICAL CO LTD (JP) | 1997-10-15 | — | — | EP | disclosed |
| US-5663264-A | OF A COPOLYMER CONTAINING AN ALKYLENE OXIDE MONOMER, A POLYFUNCTIONAL (METH)ACRYLATE MONOMER AND A VINYL MONOMER | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1997-09-02 | — | — | US | disclosed |
| US-5583191-A | FORMED OF TRANSPARENT RESIN OBTAINED BY POLYMERIZING MONOMER HAVING ALKYLENE OXIDE GROUP, POLYFUNCTIONAL (METH)ACRYLATE HAVING DIVALENT BRANCED HYDROCARBON GROUP, OPTIONAL ADDITIONAL VINYL MONOMER; HEAT RESISTANCE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1996-12-10 | — | — | US | disclosed |
| EP-0661307-A2 | Transparent resin and plastic lens | HITACHI CHEMICAL CO., LTD. (JP) | 1995-07-05 | — | — | EP | disclosed |