SCHEMBL2690138

SCHEMBL2690138

CC1OC(=O)Cc2ccccc21

nearest known ligand 0.44

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ANPEP P15144 2/20 0.44
KDM4E B2RXH2 2/20 0.41
ALDH1A1 P00352 2/20 0.41
THRB P10828 1/20 0.41
HTR2A P28223 7/20 0.41
HRH1 P35367 4/20 0.38
TRPM8 Q7Z2W7 1/20 0.38
AKT1 P31749 1/20 0.37
HTR2C P28335 1/20 0.37
HDAC4 P56524 1/20 0.37
HDAC7 Q8WUI4 1/20 0.37
HDAC5 Q9UQL6 1/20 0.37
CYP1A2 P05177 1/20 0.37
ACHE P22303 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9731911 0.74 ALDH1A1 (0.53) ANPEPKDM4EALDH1A1THRBHTR2A
SCHEMBL11655715 0.70 ANPEP (0.39) ANPEPKDM4EALDH1A1THRBHTR2A
SCHEMBL2187484 0.69 ANPEP (0.59) ANPEPHTR2AHRH1HTR2CHDAC4
SCHEMBL30633009 0.69 ANPEP (0.59) ANPEPHTR2AHRH1HTR2CHDAC4
SCHEMBL11144393 0.69 CYP1A2 (0.58) ANPEPHTR2AHRH1HTR2CHDAC4
SCHEMBL14170093 0.69 SLC6A2 (0.44) ALDH1A1HTR2AHRH1TRPM8HTR2C
SCHEMBL7900998 0.69 ALDH1A1 (0.39) ANPEPKDM4EALDH1A1THRBHTR2A
SCHEMBL17070963 0.68 ANPEP (0.57) ANPEPHTR2AHRH1HTR2CHDAC4
SCHEMBL9633656 0.68 HTR2A (0.58) ANPEPHTR2AHRH1HTR2CHDAC4
SCHEMBL2668143 0.67 ALDH1A1 (0.53) KDM4EALDH1A1AKT1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8088549-B2 Radiation-sensitive elements with developability-enhancing compounds EASTMAN KODAK COMPANY (US) 2012-01-03 US disclosed
US-7955779-B2 alkaline soluble binder; for preparing positive-working imageable elements having improved solvent resistance and for making lithographic printing plates; improved resistance to press chemicals EASTMAN KODAK COMPANY (US) 2011-06-07 US disclosed
US-7723012-B2 Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s EASTMAN KODAK COMPANY (US) 2010-05-25 US disclosed
US-20090311626-A1 RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH SOLVENT RESISTANT POLY(VINYL ACETAL)S LASER PACIFIC MEDIA CORPORATION 2009-12-17 US disclosed
US-20090162783-A1 RADIATION-SENSITIVE ELEMENTS WITH DEVELOPABILITY-ENHANCING COMPOUNDS BANK OF AMERICA, N.A., AS AGENT 2009-06-25 US disclosed
US-20090004599-A1 RADIATION-SENSITIVE COMPOSITIONS AND ELEMENTS WITH SOLVENT RESISTANT POLY(VINYL ACETAL)S BANK OF AMERICA, N.A., AS AGENT 2009-01-01 US disclosed