SCHEMBL26939293

SCHEMBL26939293

C#CC1(OC(=O)CC(=O)O)CCCC1

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.32
POLB P06746 1/20 0.32
KMT2A Q03164 1/20 0.32
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29104225 0.81 MEN1 (0.33) MEN1POLBKMT2ACYP2C19
SCHEMBL9765605 0.80 ALDH1A1 (0.33) CYP2C19
SCHEMBL26939295 0.79
SCHEMBL26939298 0.77 CYP2C19 (0.32) CYP2C19
SCHEMBL11592104 0.76 MEN1 (0.35) MEN1POLBKMT2ACYP2C19
Butane SCHEMBL3816274 0.75 DPP4 (0.32) CYP2C19
SCHEMBL2105441 0.74 MEN1 (0.36) MEN1POLBKMT2A
SCHEMBL2104316 0.74 MEN1 (0.36) MEN1POLBKMT2A
SCHEMBL5557148 0.73 MEN1 (0.33) MEN1POLBKMT2A
SCHEMBL21177835 0.72 MEN1 (0.32) MEN1POLBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230400766-A1 ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed
US-20230400766-A1 ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed