SCHEMBL26939596

SCHEMBL26939596

CCC1(OC(=O)C(C)(C)C(=O)O)CCCCC1

nearest known ligand 0.38

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ADORA3 P0DMS8 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26939611 0.98 ADORA3 (0.36) ADORA3
SCHEMBL15160856 0.89 ADORA3 (0.33) ADORA3
SCHEMBL19751260 0.84 ADORA3 (0.32) ADORA3
SCHEMBL4544328 0.82 ADORA3 (0.33) ADORA3
SCHEMBL15184081 0.82
SCHEMBL19189001 0.81 ADORA3 (0.35) ADORA3
SCHEMBL98341 0.81 ADORA3 (0.33) ADORA3
SCHEMBL47406 0.81 ADORA3 (0.33) ADORA3
SCHEMBL47405 0.81 ADORA3 (0.33) ADORA3
SCHEMBL13181253 0.81 ADORA3 (0.31) ADORA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230400766-A1 ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed
US-20230400766-A1 ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed