SCHEMBL26964152

SCHEMBL26964152

C[Si](C)(NCCc1ccccc1)O[Si](C)(C)O[Si](C)(C)NCCc1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.50
TAAR1 Q96RJ0 1/20 0.50
NPC1 O15118 2/20 0.45
RAB9A P51151 2/20 0.45
SMN1; SMN2 Q16637 2/20 0.45
KDM1A O60341 1/20 0.45
ALDH1A1 P00352 1/20 0.45
LMNA P02545 1/20 0.45
CYP1A2 P05177 1/20 0.45
CYP3A4 P08684 1/20 0.45
HTR1A P08908 1/20 0.45
ADRA2A P08913 1/20 0.45
CYP2C8 P10632 1/20 0.45
CYP2D6 P10635 1/20 0.45
CYP2C9 P11712 1/20 0.45
IDO1 P14902 1/20 0.45
TSHR P16473 1/20 0.45
NFKB1 P19838 1/20 0.45
MAOA P21397 1/20 0.45
PTGS1 P23219 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26964162 0.80 CYP3A4 (0.45) ALDH1A1CYP3A4IDO1MAOASIGMAR1
SCHEMBL6560133 0.79 ATM (0.58) ATMTAAR1NPC1RAB9ASMN1; SMN2
SCHEMBL20382909 0.72 TDP1 (0.43) ATMTAAR1SMN1; SMN2ALDH1A1IDO1
SCHEMBL5085692 0.72 TAAR1 (0.54) ATMTAAR1NPC1RAB9ASMN1; SMN2
SCHEMBL16095567 0.71 ATM (0.52) ATMTAAR1NPC1RAB9ASMN1; SMN2
SCHEMBL20365397 0.71 TDP1 (0.41) ATMTAAR1SMN1; SMN2ALDH1A1IDO1
SCHEMBL21369187 0.71 TDP1 (0.41) ATMTAAR1SMN1; SMN2ALDH1A1IDO1
SCHEMBL13577567 0.69 IDO1 (0.42) HTR1AADRA2AIDO1MAOASLC6A2
SCHEMBL7104726 0.68 SIGMAR1 (0.55) ATMTAAR1NPC1RAB9ASMN1; SMN2
SCHEMBL19355275 0.68 TAAR1 (1.00) ATMTAAR1NPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3516089-B1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MAT US LLC (US) 2023-12-20 EP claimed