SCHEMBL269774

SCHEMBL269774

CCCCC(C)N[C]=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL271630 0.93 ADH1B (0.50)
SCHEMBL5493159 0.91 ADH1B (0.53)
SCHEMBL2112384 0.91 ADH1B (0.53)
SCHEMBL11365045 0.91 ADH1B (0.53)
SCHEMBL277122 0.91 ADH1B (0.53)
SCHEMBL8518528 0.91 ADH1B (0.53)
SCHEMBL277516 0.91 ADH1B (0.53)
SCHEMBL9797214 0.91 ADH1B (0.53)
SCHEMBL271756 0.85
SCHEMBL20657646 0.81 LMNA (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 417 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111170988-A Pyrazole formamide derivative containing substituted sulfimide acyl aryl, and preparation method and application thereof 南开大学 2020-05-19 CN claimed
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
CN-110709774-B Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2023-12-08 CN disclosed
CN-116813979-A Nucleating agent, synthetic resin composition containing same, and molded article thereof 株式会社ADEKA 2023-09-29 CN disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
CN-112839988-B Nucleating agent, synthetic resin composition containing same, and molded article thereof 株式会社ADEKA 2023-06-06 CN disclosed
CN-108663902-B Colored resin composition, color filter and display device 东友精细化工有限公司 2023-05-09 CN disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
CN-111836859-B Colorant dispersion liquid, colored curable resin composition, color filter, and display device 住友化学株式会社 2022-03-25 CN disclosed
US-20210395209-A1 NUCLEATING AGENT, SYNTHETIC-RESIN COMPOSITION CONTAINING SAME, AND MOLDED OBJECT THEREOF ADEKA CORPORATION (JP) 2021-12-23 US disclosed
WO-1993022280-A1 SUBSTITUTED CYCLOHEXENE-1,2-BICARBOXYLIC ACID DERIVATIVES AND RAW MATERIALS FOR PRODUCING THEM BASF AKTIENGESELLSCHAFT (DE) 1993-11-11 WO disclosed
US-5258395-A Slow reacting substance of anaphylaxis antagonists YAMANOUCHI PHARMACEUTICAL CO., LTD. (JP) 1993-11-02 US disclosed
WO-1993016985-A1 CYANO-OXIME ETHERS, PROCESS FOR PRODUCING THEM, AGENTS CONTAINING THEM AND THEIR USE BASF AKTIENGESELLSCHAFT (DE) 1993-09-02 WO disclosed
US-5177215-A Heterocyclic compounds and pharmaceutical use thereof YAMANOUCHI PHARMACEUTICAL CO., LTD. (JP) 1993-01-05 US disclosed
EP-0488301-A1 New benzopyran compounds with pharmacological activity J. URIACH &amp; CIA. S.A. (ES) 1992-06-03 EP disclosed
EP-0476607-A2 2-Anilino-cyanopyridines and their use for pest control BASF Aktiengesellschaft (DE) 1992-03-25 EP disclosed
EP-0475158-A2 Use of alpha aryl acrylic acid derivatives for pest control BASF Aktiengesellschaft (DE) 1992-03-18 EP disclosed
US-4908368-A SRS-A antagonist MURASE KIYOSHI (JP) 1990-03-13 US disclosed
US-4855310-A Thiadiazole compounds as antagonists of SRS-A YAMANOUCHI PHARMACEUTICAL CO., LTD. (JP) 1989-08-08 US disclosed
EP-0181779-A1 Heterocyclic compounds, their production, and medicaments containing them YAMANOUCHI PHARMACEUTICAL CO. LTD. (JP) 1986-05-21 EP disclosed