SCHEMBL269782

SCHEMBL269782

COC(=O)c1cc(S(=O)(=O)O)cc(C(=O)O)c1C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.44
HPGD P15428 2/20 0.44
HSD17B10 Q99714 2/20 0.44
KDM4E B2RXH2 2/20 0.44
MEN1 O00255 3/20 0.43
KMT2A Q03164 3/20 0.43
GAA P10253 1/20 0.43
LCK P06239 1/20 0.43
FYN P06241 1/20 0.43
S1PR3 Q99500 1/20 0.40
POLB P06746 1/20 0.39
PHLPP2 Q6ZVD8 1/20 0.38
TSHR P16473 2/20 0.38
FFAR4 Q5NUL3 1/20 0.38
CA2 P00918 2/20 0.37
LMNA P02545 3/20 0.36
MAPK1 P28482 1/20 0.36
RXFP1 Q9HBX9 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
TDP1 Q9NUW8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4530099 0.98 ALDH1A1 (0.42) ALDH1A1HPGDHSD17B10KDM4EMEN1
SCHEMBL2917593 0.88 LCK (0.54) ALDH1A1HPGDHSD17B10KDM4EMEN1
Lithium Ion SCHEMBL2469323 0.84 ALDH1A1 (0.39) ALDH1A1HPGDHSD17B10KDM4EMEN1
SCHEMBL1940639 0.84 ALDH1A1 (0.39) ALDH1A1HPGDHSD17B10KDM4EMEN1
SCHEMBL7781099 0.81 ALDH1A1 (0.40) ALDH1A1HPGDHSD17B10KDM4EMEN1
SCHEMBL27138531 0.80 KDM4E (0.46) KDM4EMEN1KMT2AGAAPOLB
SCHEMBL27747650 0.80 ALDH1A1 (0.56) ALDH1A1HPGDHSD17B10KDM4EMEN1
SCHEMBL29290485 0.80 ALDH1A1 (0.56) ALDH1A1HPGDHSD17B10KDM4EMEN1
SCHEMBL28456181 0.80 LCK (0.40) ALDH1A1HPGDHSD17B10KDM4EMEN1
SCHEMBL15009548 0.79 TPMT (0.43) ALDH1A1HPGDHSD17B10KDM4EMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 852 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023115010-A1 POLYMERS HAVING STAIN RESISTANCE AND ANTIMICROBIAL/ANTIVIRAL PROPERTIES ASCEND PERFORMANCE MATERIALS OPERATIONS LLC (US) 2023-06-22 WO claimed
US-20220010171-A1 Release Coating Compositions and Articles Therefrom 3M INNOVATIVE PROPERTIES COMPANY 2022-01-13 US claimed
WO-2020128969-A1 RELEASE COATING COMPOSITIONS AND ARTICLES THEREFROM 3M INNOVATIVE PROPERTIES COMPANY (US) 2020-06-25 WO claimed
EP-2732091-A1 FLUORINATED SOIL RESIST COMPOSITIONS E. I. Du Pont de Nemours and Company (US) 2014-05-21 EP claimed
WO-2013059416-A1 NONFLUORINATED SOIL RESIST COMPOSITIONS E. I. DU PONT DE NEMOURS AND COMPANY (US) 2013-04-25 WO claimed
WO-2013059400-A1 NONFLUORINATED SOIL RESIST, REPELLENCY, AND STAIN RESIST COMPOSITIONS E. I. DU PONT DE NEMOURS AND COMPANY (US) 2013-04-25 WO claimed
WO-2013059395-A1 NONFLUORINATED SOIL RESIST AND REPELLENCY COMPOSITIONS E. I. DU PONT DE NEMOURS AND COMPANY (US) 2013-04-25 WO claimed
US-20130101783-A1 NONFLUORINATED SOIL RESIST, REPELLENCY, AND STAIN RESIST COMPOSITIONS E I DU PONT DE NEMOURS AND COMPANY (US) 2013-04-25 US claimed
US-20130102215-A1 NONFLUORINATED SOIL RESIST AND REPELLENCY COMPOSITIONS E I DU PONT DE NEMOURS AND COMPANY (US) 2013-04-25 US claimed
US-20130102214-A1 NONFLUORINATED SOIL RESIST COMPOSITIONS EI DU PONT DE NEMOURS AND COMPANY (US) 2013-04-25 US claimed
US-6664015-B1 Diacid, diol, and carbinol carboxy terminated polydimethylsiloxane comonomers with at least one being a sulfonate salt; paints, toners, protective coatings XEROX CORPORATION 2003-12-16 US claimed
US-6017671-A TONER COMPOSITION COMPRISING A POLYESTER RESIN WITH HYDROPHILIC MOIETIES AND HYDROPHOBIC END GROUPS, COLORANT, WAX, CHARGE ADDITIVE, AND SURFACE ADDITIVES; TRIBOELECTRICAL PROPERTIES XEROX CORPORATION (US) 2000-01-25 US claimed
EP-0311342-B1 Sulfoaroyl end-capped ester oligomers suitable as soil-release agents in detergent compositions and fabric-conditioner articles PROCTER & GAMBLE (US) 1995-03-08 EP claimed
US-5348832-A Toner compositions XEROX CORPORATION (US) 1994-09-20 US claimed
US-5310618-A Light-sensitive compositions and articles utilizing a compound or polymer containing an aromatic diazonium salt group and a light-absorbing residue of a sensitizing dye for trichloromethyl-s-triazine or azinium salt photopolymerization initiators FUJI PHOTO FILM CO., LTD. (JP) 1994-05-10 US claimed
US-4877896-A Sulfoaroyl end-capped ester of oligomers suitable as soil-release agents in detergent compositions and fabric-conditioner articles THE PROCTER & GAMBLE COMPANY (US) 1989-10-31 US claimed
EP-0311342-A2 Sulfoaroyl end-capped ester oligomers suitable as soil-release agents in detergent compositions and fabric-conditioner articles THE PROCTER & GAMBLE COMPANY (US) 1989-04-12 EP claimed
US-4525419-A TEREPHTHALIC WITH DICARBOXYLIC AND ALKALI METAL SULFONATE-SUBSTITUTED DICARBOXYLIC ACIDS AMERICAN HOECHST CORPORATION (US) 1985-06-25 US claimed
US-4493872-A CONTAINING ISOPHTHALIC ACID, ALIPHATIC DICARBOXYLIC ACID, DICARBOXYLIC SULFONATE, AND ALKYLENE GLYCOL AMERICAN HOECHST CORPORATION (US) 1985-01-15 US claimed
US-4476189-A MOLECULAR ORIENTATION, ADHESION AMERICAN HOECHST CORPORATION (US) 1984-10-09 US claimed