Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Vinyl Ether SCHEMBL2128143 | 0.85 | MAPT (0.32) | TDP1ALDH1A1 | |
| Vinyl Ether SCHEMBL8647037 | 0.83 | ALOX15 (0.46) | ALDH1A1ALOX15 | |
| 1,3-Butanediol SCHEMBL29094169 | 0.82 | TDP1 (0.40) | TDP1ALDH1A1ALOX15THRBTSHR | |
| Vinyl Ether SCHEMBL63807 | 0.82 | TDP1 (0.56) | TDP1ALDH1A1TSHR | |
| 1,3-Butanediol SCHEMBL18489821 | 0.82 | — | — | |
| 1,3-Butanediol SCHEMBL2871177 | 0.80 | TDP1 (0.38) | TDP1ALDH1A1ALOX15THRBTSHR | |
| 1,3-Butanediol SCHEMBL21247045 | 0.80 | TDP1 (0.38) | TDP1ALDH1A1ALOX15THRBTSHR | |
| 1,3-Butanediol SCHEMBL8729435 | 0.80 | TDP1 (0.38) | TDP1ALDH1A1ALOX15THRBTSHR | |
| 1,3-Butanediol SCHEMBL10532302 | 0.80 | TSHR (0.47) | TDP1ALDH1A1ALOX15THRBTSHR | |
| 1,3-Butanediol SCHEMBL19281717 | 0.79 | TDP1 (0.47) | TDP1ALDH1A1ALOX15THRBTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 289 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2017009301-A1 | ANTIFOULING COMPOSITION | JOTUN A/S (NO) | 2017-01-19 | — | — | WO | claimed |
| US-7026091-B2 | Positive photoresist composition and patterning process using the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2006-04-11 | — | — | US | claimed |
| US-20050019691-A1 | Positive photoresist composition and patterning process using the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2005-01-27 | — | — | US | claimed |
| US-5939235-A | PHOTOSENSITIVE CURING AGENTS HAVING AT LEAST TWO ENOL ETHER GROUPS; PERMITING THE USE OF LIGHT RAYS EXTENDING OVER A WIDE RANGE OF WAVELENGTH, PROVIDING CLEAR POSITIVE IMAGES AND A WIDE DEVELOPMENT LATITUDE | FUJI PHOTO FILM CO., LTD. (JP) | 1999-08-17 | — | — | US | claimed |
| US-5364738-A | Divinyl ethers, solubility in developers | FUJI PHOTO FILM CO., LTD. (JP) | 1994-11-15 | — | — | US | claimed |
| WO-2024141344-A1 | MULTISTAGE POLYMER COMPOSITIONS AND COATINGS COMPRISING CURED MULTISTAGE POLYMER COMPOSITIONS | ARKEMA FRANCE (FR) | 2024-07-04 | — | — | WO | disclosed |
| EP-4393963-A1 | METHODS FOR PREPARING MULTISTAGE POLYMER PARTICLE COMPOSITIONS AND CURABLE FORMULATIONS FOR THREE-DIMENSIONAL PRINTING | ARKEMA FRANCE (FR) | 2024-07-03 | — | — | EP | disclosed |
| EP-4393982-A1 | MULTISTAGE POLYMER COMPOSITIONS AND COATINGS COMPRISING CURED MULTISTAGE POLYMER COMPOSITIONS | ARKEMA FRANCE (FR) | 2024-07-03 | — | — | EP | disclosed |
| CN-117590696-A | Photosensitive resin composition | 东京应化工业株式会社 | 2024-02-23 | — | — | CN | disclosed |
| CN-111512227-B | Curable composition | 阿科玛法国公司 | 2023-11-03 | — | — | CN | disclosed |
| US-11591493-B2 | Curable compositions | ARKEMA FRANCE (FR) | 2023-02-28 | — | — | US | disclosed |
| US-11518873-B2 | Curable compositions | ARKEMA FRANCE (FR) | 2022-12-06 | — | — | US | disclosed |
| US-5658708-A | RADIATION ABSORBING MATERIAL CONTAINING ENOL ETHER GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 1997-08-19 | — | — | US | disclosed |
| US-5637428-A | POSITIVE WORKING PHOTOSENSITIVE COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 1997-06-10 | — | — | US | disclosed |
| EP-0702271-A1 | Positive working printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |
| US-5446084-A | Cathodic electrocoating bath | BASF LACKE+ FARBEN AG (DE) | 1995-08-29 | — | — | US | disclosed |
| US-5364738-A | Divinyl ethers, solubility in developers | FUJI PHOTO FILM CO., LTD. (JP) | 1994-11-15 | — | — | US | disclosed |
| EP-0609684-A1 | Positive-working light-sensitive composition | Fuji Photo Film Co., Ltd. (JP) | 1994-08-10 | — | — | EP | disclosed |
| US-5247025-A | MULTISTAGE GRAFT COPOLYMER AND ITS USE FOR THE PREPARATION OF TRANSPARENT PVC MOLDING MATERIALS | BASF AKTIENGESELLSCHAFT (DE) | 1993-09-21 | — | — | US | disclosed |
| EP-0536690-A1 | Light-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1993-04-14 | — | — | EP | disclosed |