Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Vinyl Ether. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.56 |
| ▸ | TSHR | P16473 | 4/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylene Glycol SCHEMBL1357403 | 0.83 | — | — | |
| Vinyl Ether SCHEMBL1398163 | 0.83 | TSHR (0.38) | TDP1TSHR | |
| 1,3-Butanediol SCHEMBL270009 | 0.82 | TDP1 (0.35) | TDP1TSHRALDH1A1 | |
| Vinyl Ether SCHEMBL5832474 | 0.82 | — | — | |
| Vinyl Ether SCHEMBL28082185 | 0.80 | TDP1 (0.41) | TDP1 | |
| Glycerin SCHEMBL1412723 | 0.80 | LMNA (0.53) | TSHRALDH1A1 | |
| Propylene Glycol SCHEMBL2026277 | 0.79 | TDP1 (0.67) | TDP1TSHRALDH1A1 | |
| Propylene Glycol SCHEMBL159902 | 0.79 | — | — | |
| Propylene Glycol SCHEMBL8145561 | 0.79 | TDP1 (0.67) | TDP1TSHRALDH1A1 | |
| Propylene Glycol SCHEMBL4596786 | 0.79 | TDP1 (0.67) | TDP1TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2948 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12552948-B2 | Radiation curable ink jet ink composition and ink jet method | SEIKO EPSON CORPORATION (JP) | 2026-02-17 | — | — | US | claimed |
| WO-2025080385-A1 | THERMALLY STABLE ADDITIVE FOR WELLBORE TREATMENTS | HALLIBURTON ENERGY SERVICES, INC. (US) | 2025-04-17 | — | — | WO | claimed |
| US-20250122417-A1 | THERMALLY STABLE ADDITIVE FOR WELLBORE TREATMENTS | HALLIBURTON ENERGY SERVICES , INC. | 2025-04-17 | — | — | US | claimed |
| WO-2024263211-A1 | HIGH TEMPERATURE SUSPENSION ADDITIVE FOR WELLBORE TREATMENTS | HALLIBURTON ENERGY SERVICES, INC. (US) | 2024-12-26 | — | — | WO | claimed |
| US-20240425742-A1 | High Temperature Suspension Additive For Wellbore Treatments | HALLIBURTON ENERGY SERVICES, INC. (US) | 2024-12-26 | — | — | US | claimed |
| US-20240278210-A1 | PREPARATION METHOD OF SUPER ABSORBENT POLYMER AND SUPER ABSORBENT POLYMER | LG CHEM, LTD. (KR) | 2024-08-22 | — | — | US | claimed |
| CN-110515270-B | Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device | 信越化学工业株式会社 | 2024-07-12 | — | — | CN | claimed |
| EP-4321561-A1 | PREPARATION METHOD OF SUPER ABSORBENT POLYMER AND SUPER ABSORBENT POLYMER | LG Chem, Ltd. (KR) | 2024-02-14 | — | — | EP | claimed |
| CN-117321120-A | Method for producing superabsorbent polymer and superabsorbent polymer | 株式会社LG化学 | 2023-12-29 | — | — | CN | claimed |
| US-11693317-B2 | Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | claimed |
| US-7026091-B2 | Positive photoresist composition and patterning process using the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2006-04-11 | — | — | US | claimed |
| CN-1200011-C | Ultralow surface energy type fluorocarbon resin | QINGDAO HONGFENG GROUP BUILDIN (CN) | 2005-05-04 | — | — | CN | claimed |
| US-20050019691-A1 | Positive photoresist composition and patterning process using the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2005-01-27 | — | — | US | claimed |
| CN-1570765-A | Positive photoresist composition and method for forming photoresist pattern | IND TECH RES INST (CN) | 2005-01-26 | — | — | CN | claimed |
| CN-1450091-A | Ultralow surface energy type fluorocarbon resin | QINGDAO HONGFENG GROUP BUILDIN (CN) | 2003-10-22 | — | — | CN | claimed |
| CN-1450090-A | Benzene free type fluorocarbon resin | QINGDAO HONGFENG GROUP BUILDIN (CN) | 2003-10-22 | — | — | CN | claimed |
| US-6455111-B1 | USING UNSATURATED POLYESTER RESIN FORMULATION AS IMPREGNATING, CASTING AND COATING MATERIAL | SCHENECTADY INTERNATIONAL, INC. | 2002-09-24 | — | — | US | claimed |
| US-6335468-B1 | CONDENSING N-ACYL AMINO ACID OR SALT THEREOF WITH AMINE AND/OR AMMONIA UNDER DEHYDRATING CONDITIONS IN PRESENCE OF BORON COMPOUND AS CATALYST WITH ALCOHOL COEXISTENT AS AUXILIARY SOLVENT | AJINOMOTO CO., INC. (JP) | 2002-01-01 | — | — | US | claimed |
| EP-1151040-A1 | UNSATURATED POLYESTER RESIN COMPOSITIONS | Ashland Inc. (US) | 2001-11-07 | — | — | EP | claimed |
| WO-2000046297-A1 | UNSATURATED POLYESTER RESIN COMPOSITIONS | ASHLAND INC. (US) | 2000-08-10 | — | — | WO | claimed |