SCHEMBL2700537

SCHEMBL2700537

CCCOC(C)C1CCCCC1

nearest known ligand 0.44

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.44
EPHX1 P07099 2/20 0.34
CYP1A2 P05177 3/20 0.33
CYP2D6 P10635 2/20 0.33
CYP2C19 P33261 1/20 0.33
TP53 P04637 2/20 0.32
ADH1A P07327 1/20 0.31
MEN1 O00255 1/20 0.31
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
TSHR P16473 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10445720 0.83 SHBG (0.41) SHBGEPHX1CYP1A2CYP2D6CYP2C19
SCHEMBL16287560 0.82 SHBG (0.44) SHBGEPHX1CYP1A2CYP2D6CYP2C19
SCHEMBL16286822 0.82 SHBG (0.44) SHBGEPHX1CYP1A2CYP2D6CYP2C19
SCHEMBL11853870 0.82 SHBG (0.44) SHBGEPHX1CYP1A2CYP2D6CYP2C19
SCHEMBL2701907 0.81 SHBG (0.48) SHBGEPHX1TP53ALDH1A1LMNA
SCHEMBL12124953 0.81 SHBG (0.48) SHBGEPHX1TP53ALDH1A1LMNA
SCHEMBL6367519 0.81 SHBG (0.48) SHBGEPHX1TP53ALDH1A1LMNA
SCHEMBL8054830 0.80 SHBG (0.38) SHBGEPHX1TP53ALDH1A1LMNA
SCHEMBL16287565 0.79 SHBG (0.41) SHBGEPHX1CYP1A2CYP2D6CYP2C19
SCHEMBL3101103 0.78 SHBG (0.41) SHBGEPHX1CYP1A2CYP2D6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2447773-B1 Method for producing a pattern, method for producing a MEMS structure, use of a cured film of a photosensitive composition as a sacrificial layer or as a component of a MEMS structure FUJIFILM CORP (JP) 2013-07-10 EP disclosed
US-20120107563-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, MEMS STRUCTURE, METHOD FOR PRODUCING THE STRUCTURE, METHOD FOR DRY ETCHING, METHOD FOR WET ETCHING, MEMS SHUTTER DEVICE, AND IMAGE DISPLAY APPARATUS FUJIFILM CORPORATION (JP) 2012-05-03 US disclosed
EP-2447773-A1 Photosensitive resin composition, method for producing pattern, MEMS structure, method for producing the structure, method for dry etching, method for wet etching, MEMS shutter device, and image display apparatus Fujifilm Corporation (JP) 2012-05-02 EP disclosed
US-7605111-B2 Herbicides SYNGENTA CROP PROTECTION, INC. (US) 2009-10-20 US disclosed
US-7605111-B2 Herbicides SYNGENTA CROP PROTECTION, INC. (US) 2009-10-20 US disclosed
US-7459414-B2 Herbicides SYNGENTA CROP PROTECTION, INC. (US) 2008-12-02 US disclosed
US-7459414-B2 Herbicides SYNGENTA CROP PROTECTION, INC. (US) 2008-12-02 US disclosed