Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SHBG | P04278 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | GMNN | O75496 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | BLM | P54132 | 1/20 | 0.33 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12124953 | 1.00 | SHBG (0.48) | SHBGLMNAEPHX1THRBTP53 | |
| SCHEMBL6367519 | 1.00 | SHBG (0.48) | SHBGLMNAEPHX1THRBTP53 | |
| SCHEMBL12124952 | 0.97 | SHBG (0.44) | SHBGLMNAEPHX1THRBTP53 | |
| SCHEMBL12972065 | 0.97 | SHBG (0.44) | SHBGLMNAEPHX1THRBTP53 | |
| SCHEMBL13905509 | 0.92 | — | — | |
| SCHEMBL14753017 | 0.92 | — | — | |
| SCHEMBL2754804 | 0.87 | — | — | |
| SCHEMBL10416643 | 0.81 | SHBG (0.44) | SHBGLMNAEPHX1THRBTP53 | |
| SCHEMBL2700537 | 0.81 | SHBG (0.44) | SHBGLMNAEPHX1TP53ALDH1A1 | |
| SCHEMBL11842539 | 0.80 | SHBG (0.48) | SHBGLMNAEPHX1THRBTP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230400766-A1 | ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20210397097-A1 | METHOD OF PRODUCING MOLDED PRODUCT, RESIST FOR COLLECTIVE MOLDING WITH IMPRINT-ELECTRONIC LITHOGRAPHY, METHOD OF PRODUCING REPLICA MOLD, METHOD OF PRODUCING DEVICE, AND IMPRINT MATERIAL | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2021-12-23 | — | — | US | disclosed |
| US-11009790-B2 | Photoacid generator and photoresist composition including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-05-18 | — | — | US | disclosed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20180099928-A1 | SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-04-12 | — | — | US | disclosed |
| US-20180031967-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-01 | — | — | US | disclosed |
| US-20180031967-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-01 | — | — | US | disclosed |
| CN-103019032-B | Photosensitive resin composition, the forming method of cured film, cured film, organic EL display and liquid crystal display device | 富士胶片株式会社 | 2018-01-23 | — | — | CN | disclosed |
| US-9703193-B2 | Onium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-07-11 | — | — | US | disclosed |
| US-7863454-B2 | 3-substituted-6-aryl pyridines | NOVARTIS INTERNATIONAL PHARMACEUTICAL LTD. (BM) | 2011-01-04 | — | — | US | disclosed |
| US-7833694-B2 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-11-16 | — | — | US | disclosed |
| US-20090274978-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-05 | — | — | US | disclosed |
| US-20090233242-A1 | LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-17 | — | — | US | disclosed |
| US-20090176980-A1 | 3-Substituted-6-Aryl Pyridines | NOVARTIS INTERNATIONAL PHARMACEUTICAL LTD. (BM) | 2009-07-09 | — | — | US | disclosed |
| US-20090087799-A1 | ANTIREFLECTIVE COATING COMPOSITION, ANTIREFLECTIVE COATING, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| EP-2033966-A2 | Movel photoacid generators, resist compositons, and patterning processes | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-03-11 | — | — | EP | disclosed |
| US-20090035699-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| US-7342115-B2 | Binding antagonist and arylpyridine for antiinflammatory agents, cardiovascular disorders and antagonist or agonist and for immunology | NEUROGEN CORPORATION (US) | 2008-03-11 | — | — | US | disclosed |
| US-20070179309-A1 | fluoro (meth)acrylate or unsaturated polycyclic ester monomer as radiation-sensitive resist compositions; good development characteristics; high resolution and an anti-swelling effect; low cost production; precise micropatterning | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090176980-A1 | 3-Substituted-6-Aryl Pyridines | C3AR1, C5AR1, C5AR2 | SHBG 2234/4885LMNA 3672/4885EPHX1 976/4885 |
| US-20090035699-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | C1R, AFF1, HRH3 | SHBG 4030/4885LMNA 1164/4885EPHX1 783/4885 |
| US-20090233242-A1 | LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | WDR5, RER1, H1-5 | SHBG 2741/4885LMNA 666/4885EPHX1 730/4885 |
| US-20090274978-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | CYP21A2, C1S, C1R | SHBG 1600/4885LMNA 4448/4885EPHX1 421/4885 |
| US-20180099928-A1 | SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | C1R, LBR, SMARCC2 | SHBG 4141/4885LMNA 690/4885EPHX1 4388/4885 |
| US-20180031967-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | PAG1, CCNT1, NAT1 | SHBG 4257/4885LMNA 2845/4885EPHX1 3596/4885 |
| US-20070179309-A1 | fluoro (meth)acrylate or unsaturated polycyclic ester monomer as radiation-sensitive resist compositions; good development characteristics; high resolution and an anti-swelling effect; low cost production; precise micropatterning | AFF1, FASN, FAR1 | SHBG 2662/4885LMNA 2757/4885EPHX1 2554/4885 |
| US-11009790-B2 | Photoacid generator and photoresist composition including the same | PAG1, CCNT1, NAT1 | SHBG 4257/4885LMNA 2845/4885EPHX1 3596/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.