Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 5/20 | 0.41 |
| ▸ | CYP2A6 | P11509 | 4/20 | 0.41 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.39 |
| ▸ | HPGD | P15428 | 3/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | CASP1 | P29466 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | CASP7 | P55210 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.35 |
| ▸ | HTR2A | P28223 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | GLA | P06280 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2700216 | 0.89 | CYP1A2 (0.41) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| SCHEMBL29360084 | 0.81 | CYP1A2 (0.56) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| SCHEMBL119090 | 0.81 | CYP1A2 (0.56) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| Hydrochloric Acid SCHEMBL27879112 | 0.79 | CYP1A2 (0.54) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| Hydrogen Sulfide SCHEMBL27306888 | 0.79 | CYP1A2 (0.54) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| Ammonia Solution, Strong SCHEMBL28178967 | 0.79 | CYP1A2 (0.54) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| SCHEMBL27642965 | 0.77 | ALDH1A1 (0.35) | CYP1A2CYP2A6TSHRALDH1A1HSD17B10 | |
| SCHEMBL2251091 | 0.77 | ALDH1A1 (0.39) | CYP1A2TSHRALDH1A1HSD17B10HPGD | |
| SCHEMBL5749295 | 0.77 | HTR2A (0.44) | CYP1A2CYP2A6ALDH1A1HSD17B10HPGD | |
| SCHEMBL2250267 | 0.77 | CYP1A2 (0.33) | CYP1A2CYP2A6ALDH1A1HSD17B10HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3064997-B1 | LAMINATE AND USE OF A KIT FOR MANUFACTURING OF A LAMINATE | FUJIFILM CORP (JP) | 2021-04-28 | — | — | EP | disclosed |
| US-10833272-B2 | Laminate and kit | FUJIFILM CORPORATION (JP) | 2020-11-10 | — | — | US | disclosed |
| CN-105683835-B | Laminated body, organic semiconductor manufacture are manufactured with set group and organic semiconductor uses light resistance composition | 富士胶片株式会社 | 2019-11-26 | — | — | CN | disclosed |
| US-10439139-B2 | — | — | 2019-10-08 | — | — | US | disclosed |
| CN-105474099-B | Laminated body | 富士胶片株式会社 | 2019-09-03 | — | — | CN | disclosed |
| CN-103091986-B | Positive-type photosensitive resin composition, cured film and forming method thereof, liquid crystal display device and organic electroluminescence display device and method of manufacturing same | 富士胶片株式会社 | 2018-05-18 | — | — | CN | disclosed |
| CN-102955361-B | Positive-type photosensitive resin composition, the forming method of cured film, cured film, liquid crystal display device and organic EL display | 富士胶片株式会社 | 2018-04-06 | — | — | CN | disclosed |
| US-9929376-B2 | Laminate, kit for manufacturing organic semiconductor, and resist composition for manufacturing organic semiconductor | FUJIFILM CORPORATION (JP) | 2018-03-27 | — | — | US | disclosed |
| US-20180040824-A1 | LAMINATE AND KIT | FUJIFILM CORPORATION (JP) | 2018-02-08 | — | — | US | disclosed |
| EP-2818462-B1 | CYCLIC AZINE DERIVATIVES, PROCESSES FOR PRODUCING THESE, AND ORGANIC ELECTROLUMISCENT ELEMENT CONTAINING THESE AS COMPONENT | TOSOH CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| CN-102725693-A | Photosensitive resin composition, cured film, method for forming cured film, organic EL display device, and liquid crystal display device | FUJIFILM CORP | 2012-10-10 | — | — | CN | disclosed |
| US-20120231396-A1 | RESIN PATTERN, METHOD FOR PRODUCING THE PATTERN, METHOD FOR PRODUCING MEMS STRUCTURE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING PLATED PATTERN | FUJIFILM CORPORATION (JP) | 2012-09-13 | — | — | US | disclosed |
| EP-2498133-A2 | Resin pattern, method for producing the pattern, method for producing MEMS structure, method for manufacturing semiconductor device, and method for producing plated pattern | Fujifilm Corporation (JP) | 2012-09-12 | — | — | EP | disclosed |
| US-20120214993-A1 | CYCLIC AZINE DERIVATIVES, PROCESSES FOR PRODUCING THESE, AND ORGANIC ELECTROLUMINESCENT ELEMENT CONTAINING THESE AS COMPONENT | SAGAMI CHEMICAL RESEARCH INSTITUTE, (JP) | 2012-08-23 | — | — | US | disclosed |
| EP-2468731-A1 | CYCLIC AZINE DERIVATIVES, PROCESSES FOR PRODUCING THESE, AND ORGANIC ELECTROLUMINESCENT ELEMENT CONTAINING THESE AS COMPONENT | Tosoh Corporation (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-20120107563-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, MEMS STRUCTURE, METHOD FOR PRODUCING THE STRUCTURE, METHOD FOR DRY ETCHING, METHOD FOR WET ETCHING, MEMS SHUTTER DEVICE, AND IMAGE DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2012-05-03 | — | — | US | disclosed |
| EP-2447773-A1 | Photosensitive resin composition, method for producing pattern, MEMS structure, method for producing the structure, method for dry etching, method for wet etching, MEMS shutter device, and image display apparatus | Fujifilm Corporation (JP) | 2012-05-02 | — | — | EP | disclosed |
| CN-102193316-A | Positive photosensitive resin composition, formation method of curing film, curing film, organic el display device and liquid crystal display device | FUJI PHOTO FILM CO LTD | 2011-09-21 | — | — | CN | disclosed |
| US-20060293503-A1 | Polyaminopyridines and method for producing same | SUMITOMO SEIKA CHEMICALS CO., LTD (JP) | 2006-12-28 | — | — | US | disclosed |
| EP-1669390-A1 | POLYAMINOPYRIDINES AND METHOD FOR PRODUCING SAME | SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) | 2006-06-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120214993-A1 | CYCLIC AZINE DERIVATIVES, PROCESSES FOR PRODUCING THESE, AND ORGANIC ELECTROLUMINESCENT ELEMENT CONTAINING THESE AS COMPONENT | CPNE4, EPB41, AZI2 | CYP1A2 1801/4885CYP2A6 3586/4885TSHR 2974/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.