Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 2/20 | 0.43 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.40 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.39 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | FOLH1 | Q04609 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6693929 | 0.84 | GABRA1 (0.42) | GABRA1GABRB2CYP3A4HDAC3HDAC1 | |
| SCHEMBL4938884 | 0.84 | GABRA1 (0.42) | GABRA1GABRB2CYP3A4HDAC3HDAC1 | |
| SCHEMBL89060 | 0.82 | FOLH1 (0.55) | GABRA1GABRB2CYP3A4KDM4EMAPT | |
| Benzene SCHEMBL27083018 | 0.82 | FOLH1 (0.55) | GABRA1GABRB2CYP3A4KDM4EMAPT | |
| SCHEMBL474921 | 0.82 | GABRA1 (0.47) | GABRA1GABRB2CYP3A4HDAC3HDAC1 | |
| SCHEMBL9356378 | 0.82 | KDM4E (0.44) | GABRA1GABRB2CYP3A4HDAC3HDAC1 | |
| SCHEMBL8755295 | 0.82 | GABRA1 (0.41) | GABRA1GABRB2CYP3A4HDAC3HDAC1 | |
| SCHEMBL11094883 | 0.81 | FOLH1 (0.53) | GABRA1GABRB2CYP3A4KDM4EMAPT | |
| Hydrochloric Acid SCHEMBL7974299 | 0.81 | FOLH1 (0.53) | GABRA1GABRB2CYP3A4KDM4EMAPT | |
| Potassium SCHEMBL16531822 | 0.81 | FOLH1 (0.53) | GABRA1GABRB2CYP3A4KDM4EMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1373980-B1 | HIGH PERFORMANCE, PHOTOIMAGEABLE RESIN COMPOSITIONS AND PRINTING PLATES PREPARED THEREFROM | NAPP SYSTEMS INC (US) | 2012-05-09 | — | — | EP | claimed |
| WO-2008017318-A1 | OPTICAL DEVICE AND POLYMER MATERIAL WITH NONLINEAR OPTICAL PROPERTIES | PIRELLI & C. S.P.A. (IT) | 2008-02-14 | — | — | WO | claimed |
| EP-1375569-B1 | Radiation-curable mixtures comprising highly-branched polyesters having acrylate terminal groups | DAINIPPON INK & CHEMICALS (JP) | 2007-10-10 | — | — | EP | claimed |
| CN-112204684-B | Oil leakage repairing material, oil leakage repairing method and piping | 迪睿合株式会社 | 2024-07-12 | — | — | CN | disclosed |
| US-20240228804-A1 | METHOD OF IMPROVING ACTINIC CURE OF ENERGY CURABLE INKS AND COATINGS | SUN CHEMICAL CORPORATION (US) | 2024-07-11 | — | — | US | disclosed |
| WO-2024135299-A1 | LIQUID LEAKAGE REPAIR COMPOSITION AND LIQUID LEAKAGE REPAIR METHOD | デクセリアルズ株式会社 | 2024-06-27 | — | — | WO | disclosed |
| WO-2024127938-A1 | LIQUID LEAKAGE-REPAIRING METHOD | デクセリアルズ株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024106445-A1 | COMPOSITION FOR REPAIRING LIQUID LEAKAGE AND METHOD FOR REPAIRING LIQUID LEAKAGE | デクセリアルズ株式会社 | 2024-05-23 | — | — | WO | disclosed |
| US-11976769-B2 | Oil leakage repairing material, oil leakage repairing method, and pipe | DEXERIALS CORPORATION (JP) | 2024-05-07 | — | — | US | disclosed |
| US-11976202-B2 | Method of improving actinic cure of energy curable inks and coatings | SUN CHEMICAL CORPORATION (US) | 2024-05-07 | — | — | US | disclosed |
| EP-3033324-B1 | OLIGOMERIC AMINOKETONES AND THEIR USE AS PHOTOINITIATORS | SUN CHEMICAL CORP (US) | 2024-03-13 | — | — | EP | disclosed |
| WO-2013082262-A1 | PHOTOACTIVE RESINS, RADIATION CURABLE COMPOSITIONS AND RADIATION CURABLE INKS | SUN CHEMICAL CORPORATION (US) | 2013-06-06 | — | — | WO | disclosed |
| US-7385016-B2 | Curable resin compositions and process for preparing oligomers containing acrylate groups and substituted methacrylate groups | DAINIPPON INK & CHEMICALS, INC. (JP) | 2008-06-10 | — | — | US | disclosed |
| WO-2008017318-A1 | OPTICAL DEVICE AND POLYMER MATERIAL WITH NONLINEAR OPTICAL PROPERTIES | PIRELLI & C. S.P.A. (IT) | 2008-02-14 | — | — | WO | disclosed |
| US-7235616-B2 | Curable resin compositions and process for preparing oligomers containing acrylate groups and substituted methacrylate groups | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2007-06-26 | — | — | US | disclosed |
| EP-1777269-A1 | Curable composition and acryloyl group containing curable oligomer and process for producing the acryloyl group containing curable oligomer | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2007-04-25 | — | — | EP | disclosed |
| US-20050119361-A1 | Curable resin compositions and process for preparing oligomers containing acrylate groups and substituted methacrylate groups | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2005-06-02 | — | — | US | disclosed |
| EP-1323748-B1 | Curable resin compositions and process for preparing oligomers containing acrylate groups and substituted methacrylate groups | DAINIPPON INK & CHEMICALS (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-20030171523-A1 | Curable resin compositions and process for preparing oligomers containing acrylate groups and substituted methacrylate groups | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2003-09-11 | — | — | US | disclosed |
| EP-1323748-A1 | Curable resin compositions and process for preparing oligomers containing acrylate groups and substituted methacrylate groups | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2003-07-02 | — | — | EP | disclosed |