SCHEMBL271102

SCHEMBL271102

C=CCc1c(CC=C)c(C(=O)O)c(C(=O)O)c(CC=C)c1C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.35
GAA P10253 1/20 0.35
TSHR P16473 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
HSD17B10 Q99714 1/20 0.35
CYP1A2 P05177 1/20 0.33
MAPK1 P28482 1/20 0.30
SRD5A1 P18405 1/20 0.30
RXRA P19793 1/20 0.30
NR4A2 P43354 1/20 0.30
PDE4B Q07343 1/20 0.30
PDE4D Q08499 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29458340 1.00 KDM4E (0.35) KDM4EGAATSHRSMN1; SMN2HSD17B10
SCHEMBL8846408 0.95 KDM4E (0.37) KDM4EGAATSHRSMN1; SMN2HSD17B10
SCHEMBL3227961 0.95 KDM4E (0.37) KDM4EGAATSHRSMN1; SMN2HSD17B10
SCHEMBL8212422 0.95 KDM4E (0.37) KDM4EGAATSHRSMN1; SMN2HSD17B10
Acrylic Acid SCHEMBL30476545 0.94 LMNA (0.42) KDM4EGAATSHRSMN1; SMN2HSD17B10
SCHEMBL16191206 0.93 KDM4E (0.36) KDM4EGAATSHRSMN1; SMN2HSD17B10
SCHEMBL7783028 0.85 KDM4E (0.33) KDM4EGAATSHRSMN1; SMN2HSD17B10
SCHEMBL28779595 0.85 KDM4E (0.33) KDM4EGAATSHRSMN1; SMN2HSD17B10
SCHEMBL22502421 0.84 KDM4E (0.34) KDM4EGAATSHRSMN1; SMN2HSD17B10
SCHEMBL30331187 0.83 KDM4E (0.32) KDM4EGAATSHRSMN1; SMN2HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130115543-A1 THERMOSTABLE POLYMER ELECTROLYTE MEMBRANE AND PROCESS FOR PRODUCING THE SAME JAPAN ATOMIC ENERGY AGENCY (JP) 2013-05-09 US claimed
US-7803846-B2 Highly durable polymer electrolytic membrane for a fuel cell having a cross-linked structure JAPAN ATOMIC ENERGY AGENCY (JP) 2010-09-28 US claimed
US-20060134493-A1 Highly durable polymer electrolytic membrane for a fuel cell having a cross-linked structure JAPAN ATOMIC ENERGY AGENCY (JP) 2006-06-22 US claimed
EP-0273724-B1 ACID GAS SCRUBBING BY COMPOSITE SOLVENT-SWOLLEN MEMBRANES BEND RESEARCH, INC. (US) 1992-06-17 EP claimed
CN-119137686-A Conductive paste, RFID inlay, method for manufacturing RFID inlay, use of conductive paste for bonding chips, and use of conductive paste for obtaining RFID inlay 积水化学工业株式会社 2024-12-13 CN disclosed
CN-113045817-B Cushioning body and shoe 株式会社爱世克私 2024-02-09 CN disclosed
CN-113045816-B Cushioning body and shoe 株式会社爱世克私 2024-01-09 CN disclosed
CN-116931332-A Dimming device 江苏集萃智能液晶科技有限公司 2023-10-24 CN disclosed
WO-2023191081-A1 POLYOLEFIN RESIN FOAM AND MOLDED ARTICLE 積水化学工業株式会社 2023-10-05 WO disclosed
CN-111518307-B Polyolefin resin foam sheet and adhesive tape 积水化学工业株式会社 2023-08-22 CN disclosed
CN-113474401-B Polyolefin resin foam sheet and adhesive tape using same 积水化学工业株式会社 2023-08-08 CN disclosed
CN-111727215-B Antioxidant-containing methane-forming crosslinking composition and articles thereof 博里利斯股份公司 2022-08-09 CN disclosed
US-6015845-A Binder for building structure ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 2000-01-18 US disclosed
EP-0970978-A1 Radiation-curable liquid resin composition suitable for coating optical fibers and optical fiber coated therewith SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-01-12 EP disclosed
US-6013759-A Polyamideimide for optical communications and method for preparing the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2000-01-11 US disclosed
CN-1207757-A Adhesive for building structures ASAHI CHEMICAL IND (JP) 1999-02-10 CN disclosed
EP-0872529-A1 BINDER FOR BUILDING STRUCTURES Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1998-10-21 EP disclosed
EP-0849296-A2 A photocurable resin composition and a method for producing the same TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1998-06-24 EP disclosed
CN-1059410-A Image forming apparatus, apparatus component and facsimile apparatus CANON KK (JP) 1992-03-11 CN disclosed
CN-85107537-A Embed the method for Circuits System and electronic circuit system 1987-04-15 CN disclosed