SCHEMBL27299441

SCHEMBL27299441

O=C(OC1CCC(C(=O)Oc2c(F)c(F)c(C(O)O)c(F)c2F)CC1)c1cc(I)cc(I)c1I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19678540 0.87 — —
SCHEMBL19678484 0.75 SERPINE1 (0.36) —
SCHEMBL26807630 0.73 TSHR (0.32) —
SCHEMBL26068000 0.71 POLB (0.31) —
SCHEMBL22097494 0.71 HDAC3 (0.34) —
SCHEMBL21912393 0.70 SERPINE1 (0.35) —
SCHEMBL19756170 0.70 — —
SCHEMBL22097512 0.70 ACACB (0.33) —
SCHEMBL21911813 0.69 HDAC3 (0.30) —
SCHEMBL26426806 0.69 MAPT (0.30) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024127977-A1 RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT 東京応化工業株式会社 2024-06-20 — — WO disclosed
Send feedback