SCHEMBL27345656

SCHEMBL27345656

CCCCCCCCCCCCCCCCCCCCCCCCCc1ccnc(CCCCCCCCCCCCCCCCCCCCCC)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 1/20 0.50
LNPEP Q9UIQ6 1/20 0.47
TDP1 Q9NUW8 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
PTGS2 P35354 3/20 0.46
ESR1 P03372 2/20 0.46
ADRA2A P08913 2/20 0.46
ADORA3 P0DMS8 2/20 0.46
TACR2 P21452 2/20 0.46
SLC6A2 P23975 2/20 0.46
SLC6A4 P31645 2/20 0.46
SLC6A3 Q01959 2/20 0.46
KDM4E B2RXH2 2/20 0.46
ALDH1A1 P00352 2/20 0.46
HSD17B10 Q99714 2/20 0.46
LMNA P02545 1/20 0.46
SHBG P04278 1/20 0.46
TP53 P04637 1/20 0.46
CYP3A4 P08684 1/20 0.46
HSPD1 P10809 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28244414 1.00 KCNH2 (0.50) KCNH2LNPEPTDP1L3MBTL1PTGS2
SCHEMBL29058198 1.00 KCNH2 (0.50) KCNH2LNPEPTDP1L3MBTL1PTGS2
SCHEMBL1328611 0.98 LNPEP (0.48) KCNH2LNPEPTDP1L3MBTL1PTGS2
SCHEMBL2555694 0.94 KCNH2 (0.48) KCNH2LNPEPTDP1L3MBTL1PTGS2
SCHEMBL16544526 0.92 CYP3A4 (0.50) KCNH2LNPEPTDP1L3MBTL1PTGS2
SCHEMBL2553622 0.92 CYP3A4 (0.46) KCNH2LNPEPTDP1L3MBTL1PTGS2
SCHEMBL6560564 0.92 KDM4E (0.44) KCNH2LNPEPTDP1L3MBTL1KDM4E
SCHEMBL2555626 0.91 KCNH2 (0.48) KCNH2LNPEPTDP1L3MBTL1PTGS2
SCHEMBL30019258 0.91 KCNH2 (0.48) KCNH2LNPEPTDP1L3MBTL1PTGS2
SCHEMBL27630660 0.91 KCNH2 (0.48) KCNH2LNPEPTDP1L3MBTL1PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102232104-A Temporary adhesive for semiconductor wafer and method for manufacturing semiconductor device using the same SUMITOMO BAKELITE CO 2011-11-02 CN disclosed
CN-1251021-C Photoresist compositions comprising polycyclic polymers with acid labile pendant groups SUMITOMO BAKELITE CO (JP) 2006-04-12 CN disclosed
CN-1210318-C Addition polymers derived from norbornene-functional monomers and process therefor SUMITOMO BAKELITE CO (JP) 2005-07-13 CN disclosed
CN-1210317-C Addition polymers of polycycloolefines containing functional substituents SUMITOMO BAKELITE CO (JP) 2005-07-13 CN disclosed
CN-1148396-C Photoeresist composition comprising polycyclic polymers with acid labile pendant groups ס�ѵ�ľ��ʽ���� 2004-05-05 CN disclosed
CN-1104450-C Homopolymers and copolymers of cationically polymerizable monomers and process for their preparation GOODRICH CO B F (US) 2003-04-02 CN disclosed
CN-1276884-A Photoresist compositions comprising polycyclic polymers including acid labile pendant groups GOODRICH CO B F (US) 2000-12-13 CN disclosed
CN-1046294-C Addition polymers from norbornene-functional monomers and methods of making the same GOODRICH CO B F (US) 1999-11-10 CN disclosed
CN-1229094-A Addition polymers derived from norbornene-functional monomers and process therefor GOODRICH CO B F (US) 1999-09-22 CN disclosed
CN-1216618-A Photoresist compositions comprising polycyclic polymers with acid labile pendant groups GOODRICH CO B F (US) 1999-05-12 CN disclosed
CN-1190410-A Addition polymers of polycycloolefines containing functional substituents GOODRICH CO B F (US) 1998-08-12 CN disclosed
CN-1135225-A Addition polymers from norbornene-functional monomers and methods of making the same GOODRICH CO B F (US) 1996-11-06 CN disclosed