Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | DPP4 | P27487 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 2/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.30 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.30 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2734963 | 0.91 | NPSR1 (0.30) | NPSR1 | |
| SCHEMBL10259462 | 0.87 | DPP4 (0.32) | DPP4CYP17A1CYP19A1 | |
| SCHEMBL14883982 | 0.82 | NPSR1 (0.32) | NPSR1L3MBTL1DPP4CYP17A1CYP19A1 | |
| SCHEMBL16706513 | 0.82 | — | — | |
| SCHEMBL18802858 | 0.81 | CYP17A1 (0.32) | NPSR1L3MBTL1DPP4CYP17A1CYP19A1 | |
| SCHEMBL2734971 | 0.81 | NPSR1 (0.39) | NPSR1L3MBTL1ALDH1A1MEN1KMT2A | |
| SCHEMBL14883984 | 0.81 | NPSR1 (0.32) | NPSR1L3MBTL1DPP4CYP17A1CYP19A1 | |
| SCHEMBL14883979 | 0.81 | NPSR1 (0.36) | NPSR1ALDH1A1DPP4CYP17A1CYP19A1 | |
| SCHEMBL2735085 | 0.81 | NPSR1 (0.38) | NPSR1L3MBTL1ALDH1A1DPP4MEN1 | |
| SCHEMBL14883985 | 0.81 | NPSR1 (0.33) | NPSR1DPP4CYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8088550-B2 | Positive resist composition and pattern forming method | FUJIFILM CORPORATION (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20090035692-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING MEHTOD | FUJIFILM CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20090023096-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-22 | — | — | US | disclosed |