SCHEMBL2734963

SCHEMBL2734963

CCC(C)(C)C(=O)OC12CC3CC(C(=O)OCOC4CCCCC4)(C1)CC(C(=O)OCOC1CCCCC1)(C3)C2

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2734962 0.91 NPSR1 (0.36) NPSR1
SCHEMBL2734966 0.85 NPSR1 (0.33) NPSR1
SCHEMBL10167866 0.84
SCHEMBL2735089 0.81 NPSR1 (0.31) NPSR1
SCHEMBL10259462 0.80 DPP4 (0.32)
SCHEMBL16866416 0.79 EPHX1 (0.32)
SCHEMBL10259468 0.79
SCHEMBL14466035 0.78 CYP17A1 (0.31) NPSR1
SCHEMBL14883943 0.78 SCN1A (0.38)
SCHEMBL17471424 0.78 FKBP1A (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8088550-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2012-01-03 US disclosed
US-20090035692-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING MEHTOD FUJIFILM CORPORATION (JP) 2009-02-05 US disclosed
US-20090023096-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2009-01-22 US disclosed