SCHEMBL2734971

SCHEMBL2734971

CCC(C)(C)C(=O)OC12CC3CC(C1)CC(C(=O)OCOCCOC)(C3)C2

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.39
RXFP1 Q9HBX9 1/20 0.35
NPC1 O15118 2/20 0.34
RAB9A P51151 2/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
ALDH1A1 P00352 2/20 0.32
TSHR P16473 2/20 0.32
MAPK1 P28482 1/20 0.31
ABL1 P00519 1/20 0.31
RIN1 Q13671 1/20 0.31
DPP8 Q6V1X1 1/20 0.31
DPP9 Q86TI2 1/20 0.31
HSD11B1 P28845 1/20 0.31
L3MBTL1 Q9Y468 2/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
LMNA P02545 1/20 0.30
EPHX2 P34913 2/20 0.30
CYP17A1 P05093 1/20 0.30
CYP19A1 P11511 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12932666 0.83 NPSR1 (0.37) NPSR1ALDH1A1TSHRABL1RIN1
SCHEMBL14666484 0.82 NPSR1 (0.44) NPSR1RXFP1NPC1RAB9ASMN1; SMN2
SCHEMBL16866394 0.81 ALDH1A1 (0.40) NPSR1RXFP1NPC1RAB9AALDH1A1
SCHEMBL13913128 0.81 NPSR1 (0.55) NPSR1RXFP1NPC1RAB9ASMN1; SMN2
SCHEMBL2734962 0.81 NPSR1 (0.36) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL2734966 0.81 NPSR1 (0.33) NPSR1
SCHEMBL25454659 0.80 NPSR1 (0.39) NPSR1ALDH1A1TSHRABL1RIN1
SCHEMBL12014320 0.80 NPSR1 (0.39) NPSR1ALDH1A1TSHRABL1RIN1
SCHEMBL10447425 0.80 NPSR1 (0.42) NPSR1RXFP1ALDH1A1L3MBTL1MEN1
SCHEMBL13563636 0.79 ALDH1A1 (0.35) NPSR1ALDH1A1TSHRDPP8DPP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8088550-B2 Positive resist composition and pattern forming method FUJIFILM CORPORATION (JP) 2012-01-03 US disclosed
US-20090035692-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING MEHTOD FUJIFILM CORPORATION (JP) 2009-02-05 US disclosed
US-20090023096-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2009-01-22 US disclosed