⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL802175 | 0.84 | CYP4F2 (0.33) | — | |
| SCHEMBL4406928 | 0.80 | MAPT (0.33) | — | |
| SCHEMBL2984810 | 0.80 | MAPT (0.33) | — | |
| SCHEMBL2982491 | 0.80 | MAPT (0.33) | — | |
| SCHEMBL14649725 | 0.75 | — | — | |
| SCHEMBL12130491 | 0.75 | HMGCR (0.37) | — | |
| SCHEMBL12330272 | 0.75 | MMP1 (0.38) | — | |
| SCHEMBL15275703 | 0.74 | — | — | |
| SCHEMBL14649744 | 0.73 | — | — | |
| SCHEMBL13531163 | 0.73 | PRKCA (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8088550-B2 | Positive resist composition and pattern forming method | FUJIFILM CORPORATION (JP) | 2012-01-03 | — | — | US | disclosed |
| US-20090035692-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING MEHTOD | FUJIFILM CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20090023096-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-22 | — | — | US | disclosed |