Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKR1C3 | P42330 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | CA12 | O43570 | 1/20 | 0.44 |
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | CA3 | P07451 | 1/20 | 0.44 |
| ▸ | CA4 | P22748 | 1/20 | 0.44 |
| ▸ | CA9 | Q16790 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | ESR1 | P03372 | 7/20 | 0.40 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.39 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | FNTA | P49354 | 1/20 | 0.38 |
| ▸ | FNTB | P49356 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phenol SCHEMBL809327 | 0.94 | AKR1C3 (0.54) | AKR1C3MAPTCA12CA1CA2 | |
| Phenol SCHEMBL1276024 | 0.94 | AKR1C3 (0.54) | AKR1C3MAPTCA12CA1CA2 | |
| Hydroquinone SCHEMBL7457994 | 0.85 | AKR1C3 (0.46) | AKR1C3MAPTCA12CA1CA2 | |
| Phenol SCHEMBL6136517 | 0.82 | AKR1C3 (0.47) | AKR1C3CA12CA1CA2GLA | |
| Resorcinol SCHEMBL27319265 | 0.82 | ALDH1A1 (0.50) | AKR1C3MAPTCA12CA1CA2 | |
| Catechol SCHEMBL14816149 | 0.81 | AKR1C3 (0.54) | AKR1C3MAPTCA12CA1CA2 | |
| Propane SCHEMBL6470808 | 0.80 | PTGS1 (0.37) | AKR1C3MAPTTDP1CYP2C9LMNA | |
| Phenol SCHEMBL6136532 | 0.79 | AKR1C3 (0.44) | AKR1C3CA12CA1CA2GLA | |
| Phenol SCHEMBL27539669 | 0.79 | CA12 (0.48) | AKR1C3MAPTCA12CA1CA2 | |
| Anthracene SCHEMBL27663469 | 0.79 | AKR1C3 (0.52) | AKR1C3MAPTGLACYP2C9HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1384399-A | Photoresist composition | HIPRAY CORP (US) | 2002-12-11 | — | — | CN | claimed |
| CN-104364279-B | Negative-working thick film photoresist | AZ电子材料卢森堡有限公司 | 2017-05-10 | — | — | CN | disclosed |
| CN-102472969-A | Photosensitive resin composition, photosensitive resin laminate, and resist pattern formation method | ASAHI KASEI E MATERIALS CORP | 2012-05-23 | — | — | CN | disclosed |
| CN-101031845-B | Aqueous developable photoimageable composition precursors for use in photopatterning processes | DU PONT | 2012-04-25 | — | — | CN | disclosed |
| CN-102113080-A | Co-processable photoimageable silver and carbon nanotube compositions and method for field emission devices | DU PONT | 2011-06-29 | — | — | CN | disclosed |
| CN-1809787-B | Aqueous developable photoimageable thick film compositions | DU PONT | 2010-11-03 | — | — | CN | disclosed |
| CN-1660598-B | Ink jet printable thick film ink compositions and processes | DU PONT | 2010-08-04 | — | — | CN | disclosed |
| CN-1660597-B | Method for depositing ink jet printable composition on basis material | DU PONT | 2010-06-16 | — | — | CN | disclosed |
| CN-101031845-A | Aqueous developable photo-imageable composition precursors for use in photo-patterning methods | DU PONT (US) | 2007-09-05 | — | — | CN | disclosed |
| CN-1904733-A | Conductor composition for use in LTCC photosensitive tape on substrate applications | DU PONT (US) | 2007-01-31 | — | — | CN | disclosed |
| CN-1384399-A | Photoresist composition | HIPRAY CORP (US) | 2002-12-11 | — | — | CN | disclosed |
| CN-1090767-C | Photoenhanced diffusion patterning for organic polymer films | DU PONT (US) | 2002-09-11 | — | — | CN | disclosed |
| CN-1242528-A | Photoimageable compositions | NICHIGO MORTON CO LTD (JP) | 2000-01-26 | — | — | CN | disclosed |
| CN-1235282-A | Photoimageable compositions having improved stripping properties in aqueous alkaline solutions | MORTON INT INC (US) | 1999-11-17 | — | — | CN | disclosed |
| CN-1232990-A | Photoimageable compositions having hydrophilic binder polymers and hydrophilic monomers | MORTON INT INC (US) | 1999-10-27 | — | — | CN | disclosed |
| CN-1168488-A | Photoimageable composition having acrylic-functional UV stabilizer | MORTON INT INC (US) | 1997-12-24 | — | — | CN | disclosed |
| CN-1145480-A | Epoxy-containing waterborne photoimageable composition | MORTON INT INC (US) | 1997-03-19 | — | — | CN | disclosed |
| CN-1132359-A | Method for treating photolithographic developer and stripper waste streams containing resist or solder mask and gamma butyrolactone or benzyl alcohol | IBM (US) | 1996-10-02 | — | — | CN | disclosed |
| CN-1079827-A | The Photoenhanced diffusion patterning of organic polymer films | DU PONT (US) | 1993-12-22 | — | — | CN | disclosed |
| CN-1050447-A | The photosensitive copper conductor composite of aqueous developable | DU PONT (US) | 1991-04-03 | — | — | CN | disclosed |