Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRB2 | P07550 | 15/20 | 0.60 |
| ▸ | ADRB1 | P08588 | 15/20 | 0.60 |
| ▸ | ADRB3 | P13945 | 15/20 | 0.60 |
| ▸ | HRH3 | Q9Y5N1 | 2/20 | 0.44 |
| ▸ | DRD3 | P35462 | 1/20 | 0.42 |
| ▸ | GABBR2 | O75899 | 1/20 | 0.40 |
| ▸ | GABBR1 | Q9UBS5 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17933449 | 0.85 | HRH3 (0.53) | ADRB2ADRB1ADRB3HRH3DRD3 | |
| SCHEMBL13286864 | 0.84 | ADRB2 (0.62) | ADRB2ADRB1ADRB3MEN1KMT2A | |
| SCHEMBL11941087 | 0.83 | MEN1 (0.50) | ADRB2ADRB1ADRB3MEN1KMT2A | |
| SCHEMBL18904537 | 0.82 | CA12 (0.55) | ADRB2ADRB1ADRB3 | |
| SCHEMBL14493141 | 0.82 | ADRB2 (0.68) | ADRB2ADRB1ADRB3HRH3DRD3 | |
| SCHEMBL19360471 | 0.81 | HRH3 (0.50) | ADRB2ADRB1ADRB3HRH3DRD3 | |
| SCHEMBL19360450 | 0.81 | HRH3 (0.54) | ADRB2ADRB1ADRB3HRH3DRD3 | |
| SCHEMBL19360454 | 0.81 | HRH3 (0.54) | ADRB2ADRB1ADRB3HRH3DRD3 | |
| SCHEMBL19360457 | 0.81 | HRH3 (0.50) | ADRB2ADRB1ADRB3HRH3DRD3 | |
| SCHEMBL2742156 | 0.81 | ADRB2 (0.63) | ADRB2ADRB1ADRB3MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9214345-B2 | Film-forming composition and ion implantation method | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-12-15 | — | — | US | disclosed |
| US-8088546-B2 | Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-7947424-B2 | urea compound substituted by hydroxyalkyl group or alkoxyalkyl group for forming urea-formaldehyde resin protective coatings; adjusting refractive index with light absorbers or crosslink-forming resin; semiconductor device, integrated circuits; light-absorption, dry etching rate | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-05-24 | — | — | US | disclosed |
| US-7846638-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| US-7727902-B2 | Composition for forming nitride coating film for hard mask | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-06-01 | — | — | US | disclosed |
| US-7425399-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-09-16 | — | — | US | disclosed |
| US-20080206680-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-08-28 | — | — | US | disclosed |
| US-7365023-B2 | Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-04-29 | — | — | US | disclosed |
| US-20070238029-A1 | Underlayer Coating Forming Composition for Lithography Containing Naphthalene Ring Having Halogen Atom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-10-11 | — | — | US | disclosed |
| US-20070148557-A1 | Composition for forming nitride coating film for hard mask | NISSAN CHEMICAL INDUSTRIES, LT. (JP) | 2007-06-28 | — | — | US | disclosed |