SCHEMBL273877

SCHEMBL273877

CCCOCCOCCOCC

nearest known ligand 0.47

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.47
TSHR P16473 3/20 0.43
HSD17B10 Q99714 1/20 0.39
THRB P10828 2/20 0.37
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
HTT P42858 1/20 0.36
MAPT P10636 1/20 0.36
CYP3A4 P08684 1/20 0.35
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12595175 1.00 ALDH1A1 (0.47) ALDH1A1TSHRHSD17B10THRBMEN1
SCHEMBL11970056 1.00 ALDH1A1 (0.47) ALDH1A1TSHRHSD17B10THRBMEN1
SCHEMBL16329751 1.00 ALDH1A1 (0.47) ALDH1A1TSHRHSD17B10THRBMEN1
SCHEMBL11970063 1.00 ALDH1A1 (0.47) ALDH1A1TSHRHSD17B10THRBMEN1
SCHEMBL11969928 1.00 ALDH1A1 (0.47) ALDH1A1TSHRHSD17B10THRBMEN1
SCHEMBL394975 1.00
SCHEMBL272689 1.00 ALDH1A1 (0.47) ALDH1A1TSHRHSD17B10THRBMEN1
SCHEMBL12680272 1.00 ALDH1A1 (0.47) ALDH1A1TSHRHSD17B10THRBMEN1
SCHEMBL2473861 0.96 ALDH1A1 (0.50) ALDH1A1TSHRHSD17B10THRBMEN1
Ether SCHEMBL25432425 0.93 ALDH1A1 (0.47) ALDH1A1TSHRHSD17B10THRBMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 172 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111373318-B Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 日产化学株式会社 2023-06-09 CN claimed
CN-111373318-A Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学株式会社 2020-07-03 CN claimed
US-12597635-B2 Electrochemical device MURATA MANUFACTURING CO., LTD. (JP) 2026-04-07 US disclosed
EP-4697415-A1 SECONDARY BATTERY AND ELECTRIC APPARATUS Zhejiang Shengxing Technology Co., Ltd (CN) 2026-02-18 EP disclosed
EP-4697403-A1 NEGATIVE-ELECTRODE ENHANCEMENT FILM FOR SECONDARY BATTERY, AND SECONDARY BATTERY AND ELECTRIC APPARATUS Zhejiang Shengxing Technology Co., Ltd (CN) 2026-02-18 EP disclosed
US-20250354093-A1 THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THINNER COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-11-20 US disclosed
WO-2025074793-A1 METHOD FOR REMOVING FUNCTIONAL LAYERS FROM PLASTIC FILM PIECES, AND METHOD FOR PRODUCING RECYCLED PLASTIC PELLET DIC株式会社 2025-04-10 WO disclosed
WO-2025028276-A1 METHOD FOR SEPARATING AND RECOVERING PLASTIC FILMS AND METHOD FOR PRODUCING RECYCLED PLASTIC PELLETS DIC株式会社 2025-02-06 WO disclosed
CN-119317879-A Diluent composition and method for manufacturing semiconductor device using the same 三菱瓦斯化学株式会社 2025-01-14 CN disclosed
CN-116891654-B Inkjet ink composition and recording method 精工爱普生株式会社 2024-11-08 CN disclosed
US-20240361693-A1 THINNER COMPOSITION, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICES USING SAID THINNER COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-10-31 US disclosed
CN-1760757-A Radioactivity sensitive resin composition SUMITOMO CHEMICAL CO (JP) 2006-04-19 CN disclosed
CN-1760758-A Radioactivity sensitive resin composition SUMITOMO CHEMICAL CO (JP) 2006-04-19 CN disclosed
EP-0464652-B1 Agent and method for removing rosin-base solder flux ARAKAWA CHEM IND (JP) 1995-09-20 EP disclosed
US-5330582-A Using mixture og glycol ether and nonionic surfactants ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 1994-07-19 US disclosed
US-5256209-A Using mixture of glycol ether, nonionic surfactant, anionic phosphate surfactant ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 1993-10-26 US disclosed
EP-0426943-B1 AGENT AND METHOD FOR REMOVING ROSINBASE SOLDER FLUX ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 1993-09-15 EP disclosed
EP-0464652-A1 Agent and method for removing rosin-base solder flux ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 1992-01-08 EP disclosed
EP-0426943-A2 Agent and method for removing rosinbase solder flux ARAKAWA CHEMICAL INDUSTRIES, LTD. (JP) 1991-05-15 EP disclosed
US-4176132-A Reaction of organic diisocyanates with water ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1979-11-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12597635-B2 Electrochemical device CLCN2, HCN4, SLC26A3 ALDH1A1 2350/4885TSHR 1300/4885HSD17B10 2045/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.