SCHEMBL2740923

SCHEMBL2740923

OOCc1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.39
TSHR P16473 2/20 0.39
SLC6A2 P23975 2/20 0.38
SLC6A3 Q01959 2/20 0.38
KMT2A Q03164 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
IDO1 P14902 3/20 0.37
L3MBTL1 Q9Y468 2/20 0.37
HTT P42858 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
AGXT P21549 3/20 0.36
LMNA P02545 2/20 0.35
CYP1A2 P05177 1/20 0.35
PTGS1 P23219 1/20 0.35
CYP2C19 P33261 1/20 0.35
PTGS2 P35354 1/20 0.35
HIF1A Q16665 1/20 0.35
HDAC6 Q9UBN7 1/20 0.35
MAPK1 P28482 1/20 0.34
CA12 O43570 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28253955 0.79 TSHR (0.60) ALDH1A1TSHRSLC6A2SLC6A3KMT2A
SCHEMBL111650 0.79
SCHEMBL3197211 0.79 ALDH1A1 (0.39) ALDH1A1TSHRSLC6A2SLC6A3KMT2A
SCHEMBL3201094 0.79 ALDH1A1 (0.39) ALDH1A1TSHRSLC6A2SLC6A3KMT2A
SCHEMBL4363424 0.77 TSHR (0.57) ALDH1A1TSHRSLC6A2SLC6A3KMT2A
Water SCHEMBL2348698 0.77 TSHR (0.57) ALDH1A1TSHRSLC6A2SLC6A3KMT2A
Hydrochloric Acid SCHEMBL38661600 0.77 TSHR (0.57) ALDH1A1TSHRSLC6A2SLC6A3KMT2A
Fluoride SCHEMBL27339282 0.77 TSHR (0.57) ALDH1A1TSHRSLC6A2SLC6A3KMT2A
SCHEMBL686320 0.76 TSHR (0.59) TSHRTDP1LMNACA12CA1
SCHEMBL3190141 0.76 TSHR (0.59) TSHRTDP1LMNACA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9120288-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2015-09-01 US disclosed
US-20130078432-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-03-28 US disclosed
US-20120003590-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed